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SPUTTERING ANGULAR-DISTRIBUTIONS OF INDIVIDUAL ELEMENTS FOR LOW-ENERGY AR ION IRRADIATION OF PTCU ALLOY
ZHENG, LP(郑里平); LI, RS; LI, MY; SHEN, WZ; LIN, JY; ZOU, ZY
1991
Source PublicationCHINESE PHYSICS LETTERS
ISSN0256-307X
Volume8Issue:1Pages:44
AbstractThe dynamic Monte Carlo program including a bombardment-induced Gibbsian segregation process was used to calculate angular distributions of individual elements from sputtered Cu0.5Pt0.5 alloy in the Ar ion energy range between 0.2 and 1.5keV. Calculated results show that for each investigated incident energy, the angular distribution of the Pt element is more forward-pointed than that of the Cu one; the reason may be that different percentage of sputtered atoms (37 approximately 45% of Pt and 12 approximately 19% of Cu) come from beneath the topmost layer.
Indexed BySCI
Funding Project应物所项目组
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/10163
Collection中科院上海原子核所2003年前
Recommended Citation
GB/T 7714
ZHENG, LP,LI, RS,LI, MY,et al. SPUTTERING ANGULAR-DISTRIBUTIONS OF INDIVIDUAL ELEMENTS FOR LOW-ENERGY AR ION IRRADIATION OF PTCU ALLOY[J]. CHINESE PHYSICS LETTERS,1991,8(1):44.
APA ZHENG, LP,LI, RS,LI, MY,SHEN, WZ,LIN, JY,&ZOU, ZY.(1991).SPUTTERING ANGULAR-DISTRIBUTIONS OF INDIVIDUAL ELEMENTS FOR LOW-ENERGY AR ION IRRADIATION OF PTCU ALLOY.CHINESE PHYSICS LETTERS,8(1),44.
MLA ZHENG, LP,et al."SPUTTERING ANGULAR-DISTRIBUTIONS OF INDIVIDUAL ELEMENTS FOR LOW-ENERGY AR ION IRRADIATION OF PTCU ALLOY".CHINESE PHYSICS LETTERS 8.1(1991):44.
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