CAS OpenIR  > 中科院上海原子核所2003年前
AMS用多靶位强流溅射负离子源的研制
斯厚智; 张维忠; 朱锦华; 杜光天; 张苕荣; 高香
1992-06-29
Source Publication核技术
Issue06
Abstract一台用于超灵敏质谱(AMS)的带有多靶机构的强流溅射负离子源已经研制完成。为了满足AMS的特殊要求;源的设计着重解决提高流强、降低记忆效应及改善发射度等方面的问题;并且十分注意确保其性能的可靠性与稳定性。样机在试验台架上进行了一年多的调试并进一步作了改进。迄今已引出了10μA BeO~-、5μA Al~-、4.5μA Fe~-、350μA C~-以及其他十余个离子品种。100μA以下测得的归一化发射度约为2-4π mm·mrad·MeV~(1/2)。对记忆效应与电离效率也进行了初步测定。
Indexed ByCNKI
Language中文
Funding Project原子核所项目组
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/10865
Collection中科院上海原子核所2003年前
Recommended Citation
GB/T 7714
斯厚智,张维忠,朱锦华,等. AMS用多靶位强流溅射负离子源的研制[J]. 核技术,1992(06).
APA 斯厚智,张维忠,朱锦华,杜光天,张苕荣,&高香.(1992).AMS用多靶位强流溅射负离子源的研制.核技术(06).
MLA 斯厚智,et al."AMS用多靶位强流溅射负离子源的研制".核技术 .06(1992).
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