CAS OpenIR  > 中科院上海原子核所2003年前
表面活性剂对硅表面清洗效果的研究
荣廷文; 林森浩; 秦俊法; 王学波
1988-06-29
Source Publication半导体技术
Issue03
Abstract本文叙述了用示踪法研究表面活性剂对硅片表面上金属元素的清洗效果.
Indexed ByCNKI
Language中文
Funding Project原子核所项目组
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/11103
Collection中科院上海原子核所2003年前
Recommended Citation
GB/T 7714
荣廷文,林森浩,秦俊法,等. 表面活性剂对硅表面清洗效果的研究[J]. 半导体技术,1988(03).
APA 荣廷文,林森浩,秦俊法,&王学波.(1988).表面活性剂对硅表面清洗效果的研究.半导体技术(03).
MLA 荣廷文,et al."表面活性剂对硅表面清洗效果的研究".半导体技术 .03(1988).
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