CAS OpenIR  > 中科院上海原子核所2003年前
穿透散射法测定氮化钽薄膜的原子比
张达明; 吴俊恒; 王玟珉; 胡序胜
1985-07-30
Source Publication核技术
Issue07
Abstract<正> 高精度、高稳定性氮化钽薄膜电阻器;是先在二极阴极溅射钽的同时;向真空室内充入适当量的氮气;进行反应溅射而获得氮化钽膜;再经过热处理和阻值调整后而制得的。实践表明;严格控制制作工艺过程中的氮气分压;使之生成具有一定氮-钽原子比值的薄膜;是制备优质氮化钽薄膜电阻器的关键之一。
Indexed ByCNKI
Language中文
Funding Project原子核所项目组
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/11202
Collection中科院上海原子核所2003年前
Recommended Citation
GB/T 7714
张达明,吴俊恒,王玟珉,等. 穿透散射法测定氮化钽薄膜的原子比[J]. 核技术,1985(07).
APA 张达明,吴俊恒,王玟珉,&胡序胜.(1985).穿透散射法测定氮化钽薄膜的原子比.核技术(07).
MLA 张达明,et al."穿透散射法测定氮化钽薄膜的原子比".核技术 .07(1985).
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