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高气压屏栅电离室的调试和~(58)Ni(n,p)反应双微分截面的试测
张雪梅; 陈泽民; 梁伟; 唐国有; 张国辉; GledenovYd; KhuukhenkhuuG; SedyshevaMV
1999-01-10
Source Publication核技术
Issue01
Abstract介绍了高气压屏栅电离室的结构和调试;并对58Ni(n;p)试测结果进行了分析;结果证明此电离室和测量方法对(n;p)反应的测量是适用的。目前正用此电离室进行测量(n;p)反应截面的实验.
Indexed ByCNKI
Language中文
Funding Project原子核所项目组
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/11434
Collection中科院上海原子核所2003年前
Recommended Citation
GB/T 7714
张雪梅,陈泽民,梁伟,等. 高气压屏栅电离室的调试和~(58)Ni(n,p)反应双微分截面的试测[J]. 核技术,1999(01).
APA 张雪梅.,陈泽民.,梁伟.,唐国有.,张国辉.,...&SedyshevaMV.(1999).高气压屏栅电离室的调试和~(58)Ni(n,p)反应双微分截面的试测.核技术(01).
MLA 张雪梅,et al."高气压屏栅电离室的调试和~(58)Ni(n,p)反应双微分截面的试测".核技术 .01(1999).
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