CAS OpenIR  > 中科院上海原子核所2003年前
金属净洗剂6501及6503在半导体器件工艺中的应用
王学波; 戴根财; 荣廷文; 徐至中
1980-06-29
Source Publication半导体技术
Issue03
Abstract<正> 半导体硅片的清洗工艺是半导体器件生产中最关键的工艺之一;它对器件的特性及其可靠性有着决定性的作用.迄今为止;在半导体器件生产工艺中几乎全部都使用具有强烈腐蚀性的氧化剂或无机酸;如硝酸、硫酸、双氧水、盐酸等试剂.这些试剂因为具
Indexed ByCNKI
Language中文
Funding Project原子核所项目组
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/11661
Collection中科院上海原子核所2003年前
Recommended Citation
GB/T 7714
王学波,戴根财,荣廷文,等. 金属净洗剂6501及6503在半导体器件工艺中的应用[J]. 半导体技术,1980(03).
APA 王学波,戴根财,荣廷文,&徐至中.(1980).金属净洗剂6501及6503在半导体器件工艺中的应用.半导体技术(03).
MLA 王学波,et al."金属净洗剂6501及6503在半导体器件工艺中的应用".半导体技术 .03(1980).
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