CAS OpenIR  > 中科院上海原子核所2003年前
慢正电子束研究电子束固化涂层的微观结构
郑万辉; 俞方华; 童永彭; 吴桂刚; 翁惠民; 邓斌; 戴毅刚
1996-11-10
Source Publication辐射研究与辐射工艺学报
Issue04
Abstract用慢正电子束多普勒展宽谱研究环氧丙烯酸酯(EA)体系电子束固化(EBC)涂层。S-E曲线给出了稀释剂分子结构及其相对含量、辐射剂量、预聚物和交联剂含量等对EBC涂层微观结构的影响;以及随深度变化的信息。
Indexed ByCNKI
Language中文
Funding Project原子核所项目组
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/11811
Collection中科院上海原子核所2003年前
Recommended Citation
GB/T 7714
郑万辉,俞方华,童永彭,等. 慢正电子束研究电子束固化涂层的微观结构[J]. 辐射研究与辐射工艺学报,1996(04).
APA 郑万辉.,俞方华.,童永彭.,吴桂刚.,翁惠民.,...&戴毅刚.(1996).慢正电子束研究电子束固化涂层的微观结构.辐射研究与辐射工艺学报(04).
MLA 郑万辉,et al."慢正电子束研究电子束固化涂层的微观结构".辐射研究与辐射工艺学报 .04(1996).
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