CAS OpenIR  > 中科院上海原子核所2003年前
硼靶制备技术的研究
许国基; 魏永钦
1999-07-20
Source Publication原子能科学技术
Issue04
Abstract介绍 B靶制备技术及其质量厚度测量方法。静电振动、高压电喷和离心沉淀主要用于制备有衬 B靶;而聚焦重离子束溅射和电子轰击可用来制备自支撑 B靶和有衬 B靶。 B靶的质量厚度用分光光度法和称重法测量。
Indexed ByCNKI
Language中文
Funding Project原子核所项目组
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/11856
Collection中科院上海原子核所2003年前
Recommended Citation
GB/T 7714
许国基,魏永钦. 硼靶制备技术的研究[J]. 原子能科学技术,1999(04).
APA 许国基,&魏永钦.(1999).硼靶制备技术的研究.原子能科学技术(04).
MLA 许国基,et al."硼靶制备技术的研究".原子能科学技术 .04(1999).
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