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三联吡啶钌(Ⅲ)光敏损伤DNA的凝胶电泳研究
张连文; 林维真; 韩镇辉; 姚思德; 林念芸
2000-08-10
Source Publication辐射研究与辐射工艺学报
Issue03
Abstract采用琼脂糖凝胶电泳研究了以可见光引发的三联吡啶钌(Ⅲ)与 DNA之间的光敏反应。发现在有氧气条件下;三联吡啶钌(Ⅲ)经 427~457nm光照可导致 DNA的光敏损伤;其途径主要是通过单线态氧与 DNA反应引起的碱基损伤;另外则是通过 DNA与三联吡啶钌阳离子自由基([Ru2+(bpy)2(bpy+·)]3+)反应导致碱基损伤而产生的;而且损伤与 DNA和联吡啶钌之间的浓度比存在着一定关系。对照单链DNA及双链DNA光敏损伤结果后发现;单链DNA较双链DNA更易于产生光敏损伤;这可能是由于单链DNA中碱基较双链DNA中的更为暴露的缘故。
Indexed ByCNKI
Language中文
Funding Project原子核所项目组
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/11921
Collection中科院上海原子核所2003年前
Recommended Citation
GB/T 7714
张连文,林维真,韩镇辉,等. 三联吡啶钌(Ⅲ)光敏损伤DNA的凝胶电泳研究[J]. 辐射研究与辐射工艺学报,2000(03).
APA 张连文,林维真,韩镇辉,姚思德,&林念芸.(2000).三联吡啶钌(Ⅲ)光敏损伤DNA的凝胶电泳研究.辐射研究与辐射工艺学报(03).
MLA 张连文,et al."三联吡啶钌(Ⅲ)光敏损伤DNA的凝胶电泳研究".辐射研究与辐射工艺学报 .03(2000).
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