CAS OpenIR  > 中科院上海原子核所2003年前
钽电容器电介质层厚度的测量
吴俊恒; 王玟珉; 张达明
1982
Source Publication核技术
Issue05
Abstract<正> 金属钽片在阳极氧化处理过程中;在不同的电解液、电解电压及通电时间下;会形成不同厚度的Ta_2O_5层;即可制成各种不同耐压规格的钽电容器。钽基片上的Ta_2O_5层厚度与阳极氧化工艺之间的数量关系过去不太清楚。用离子束背散射方法便可很好地解决这一问题;并且具有简便、可靠、无需标准样品、不破坏样品等优点。钽片的阳极氧化处理一般有两种方法。一种是先预赋能;然后再赋能;另一种是不预赋能而仅
Indexed ByCNKI
Language中文
Funding Project原子核所项目组
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/12032
Collection中科院上海原子核所2003年前
Recommended Citation
GB/T 7714
吴俊恒,王玟珉,张达明. 钽电容器电介质层厚度的测量[J]. 核技术,1982(05).
APA 吴俊恒,王玟珉,&张达明.(1982).钽电容器电介质层厚度的测量.核技术(05).
MLA 吴俊恒,et al."钽电容器电介质层厚度的测量".核技术 .05(1982).
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