CAS OpenIR  > 中科院上海原子核所2003年前
铁靶的制备
吴解征; 严赐福
1983
Source Publication核技术
Issue02
Abstract<正> 为了制得比较厚的、均匀的铁靶;我们利用了电阻加热法和蒸发角度小、蒸发较为集中的V形坩埚(0.2×7×74mm厚的钨片制成)。接收底板装在转动的托盘上。在底板上开有31个小孔;放有31只铜碗;每只碗内放一块铝衬底;并压上一块“多孔槽区块”;防止铝衬底因转动而飞出。同时;对450-B高真空镀膜设备的电极进行了改装;使得收集衬底和蒸发坩埚之间的距离为75mm。铁的蒸发比较容易;控制蒸发电流和时间;大体上能够控制薄膜的厚度。铁的装量低于钨坩埚重量的35%时;得到的铁靶比较理想。为了使铁膜牢固地附着在铝衬底上;铝衬底的清洗非常重要。
Indexed ByCNKI
Language中文
Funding Project原子核所项目组
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/12052
Collection中科院上海原子核所2003年前
Recommended Citation
GB/T 7714
吴解征,严赐福. 铁靶的制备[J]. 核技术,1983(02).
APA 吴解征,&严赐福.(1983).铁靶的制备.核技术(02).
MLA 吴解征,et al."铁靶的制备".核技术 .02(1983).
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