CAS OpenIR  > 中科院上海原子核所2003年前
用靶添加剂提高负溅射离子源流强的研究
杜光天
1990
Source Publication核技术
Issue02
Abstract用Hiconex834溅射负离子源研究了Cs_2CrO_4、CsF和CsI等靶添加剂。-定比例的Cs_2CrO_4既改善靶表面的铯覆盖又达到喷氧的效果;Fe~-、Ag~-和Cu~-的流强分别提高到纯铁、银和铜靶的10、6和3.5倍。此外;渗少量卤化铯到合适的金属靶内;可方便地制备强的相应卤素负离子束;用慕尼黑大学的高强度负溅射源;渗5%Fe_2O_3于铁靶中;使Fe~-流强提高了一倍。
Indexed ByCNKI
Language中文
Funding Project原子核所项目组
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/12289
Collection中科院上海原子核所2003年前
Recommended Citation
GB/T 7714
杜光天. 用靶添加剂提高负溅射离子源流强的研究[J]. 核技术,1990(02).
APA 杜光天.(1990).用靶添加剂提高负溅射离子源流强的研究.核技术(02).
MLA 杜光天."用靶添加剂提高负溅射离子源流强的研究".核技术 .02(1990).
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