CAS OpenIR  > 中科院上海原子核所2003年前
用能量色散X荧光法测定磁盘磁层厚度
王裕政; 林金锌; 江立人; 顾连学
1986
Source Publication核技术
Issue09
Abstract用放射源~(238)Pu激发磁盘磁层中铁的特征X荧光来测定磁层厚度;具有快速、非破坏、精度高等优点。本文叙述测量原理、探测装置考虑、干扰因素的排除及数据处理。测定厚度范围为0.5—15μm。当厚度大于1μm时;测量精度好于5%。
Indexed ByCNKI
Language中文
Funding Project原子核所项目组
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/12333
Collection中科院上海原子核所2003年前
Recommended Citation
GB/T 7714
王裕政,林金锌,江立人,等. 用能量色散X荧光法测定磁盘磁层厚度[J]. 核技术,1986(09).
APA 王裕政,林金锌,江立人,&顾连学.(1986).用能量色散X荧光法测定磁盘磁层厚度.核技术(09).
MLA 王裕政,et al."用能量色散X荧光法测定磁盘磁层厚度".核技术 .09(1986).
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