CAS OpenIR  > 中科院上海原子核所2003年前
FORMATION OF TITANIUM SILICIDE AND SHALLOW JUNCTIONS BY BF2+ IMPLANTATION AND LOW-TEMPERATURE ANNEALING
ZHU, DZ(朱德彰); PAN, HC; ZHU, FY(朱福英); CAO, JQ(曹建清); CAO, DX(曹德新)
1989
Source PublicationNUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN0168-583X
Volume39Issue:41278
Indexed BySCI
Language英语
Funding Project原子核所项目组
WOS IDWOS:A1989T863200062
Citation statistics
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/12948
Collection中科院上海原子核所2003年前
Recommended Citation
GB/T 7714
ZHU, DZ,PAN, HC,ZHU, FY,et al. FORMATION OF TITANIUM SILICIDE AND SHALLOW JUNCTIONS BY BF2+ IMPLANTATION AND LOW-TEMPERATURE ANNEALING[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,1989,39(41278).
APA ZHU, DZ,PAN, HC,ZHU, FY,CAO, JQ,&CAO, DX.(1989).FORMATION OF TITANIUM SILICIDE AND SHALLOW JUNCTIONS BY BF2+ IMPLANTATION AND LOW-TEMPERATURE ANNEALING.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,39(41278).
MLA ZHU, DZ,et al."FORMATION OF TITANIUM SILICIDE AND SHALLOW JUNCTIONS BY BF2+ IMPLANTATION AND LOW-TEMPERATURE ANNEALING".NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 39.41278(1989).
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