Knowledge Management System Of Shanghai Institute of Applied Physics, CAS
| Evolution of hillocks in Bi thin films and their removal upon nanoscale mechanical polishing | |
| Koseva, R; Monch, I; Meier, D; Schumann, J; Arndt, KF; Schultz, L; Zhao, B; Schmidt, OG | |
| 2012 | |
| Source Publication | THIN SOLID FILMS
 |
| ISSN | 0040-6090 |
| Volume | 520Issue:17 |
| Abstract | Bismuth thin films were grown on oxidized Si substrates by electron beam evaporation. The films showed clear tendency to form hillocks inducing large surface roughness. The evolution of hillocks with film thickness and deposition rate was studied. In order to improve the surface quality of the Bi films a nanoscale mechanical polishing was performed. Upon polishing. hillocks-free Bi thin films were obtained without influencing the crystalline structure and the resistivity of the films. The achieved film surface quality allows to prepare high quality Bi Hall probes with an active area down to the nm(2) range promising for advanced device performance. (C) 2012 Elsevier B.V. All rights reserved. |
| Language | 英语 |
| Funding Project | 应物所项目组 |
| WOS ID | WOS:000305770200018 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.sinap.ac.cn/handle/331007/13156 |
| Collection | 中科院上海应用物理研究所2011-2020年 |
| Recommended Citation GB/T 7714 | Koseva, R,Monch, I,Meier, D,et al. Evolution of hillocks in Bi thin films and their removal upon nanoscale mechanical polishing[J]. THIN SOLID FILMS,2012,520(17). |
| APA | Koseva, R.,Monch, I.,Meier, D.,Schumann, J.,Arndt, KF.,...&Schmidt, OG.(2012).Evolution of hillocks in Bi thin films and their removal upon nanoscale mechanical polishing.THIN SOLID FILMS,520(17). |
| MLA | Koseva, R,et al."Evolution of hillocks in Bi thin films and their removal upon nanoscale mechanical polishing".THIN SOLID FILMS 520.17(2012). |
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| File Name/Size | DocType | Version | Access | License | ||
| Evolution of hillock（793KB） | 开放获取 | CC BY-NC-SA | View Download | |||
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