CAS OpenIR  > 中科院上海应用物理研究所2011-2019年
Absolute surface metrology by rotational averaging in oblique incidence interferometry
Lin, WH; He, YM; Song, L; Luo, HX; Wang, J; wangjie@sinap.ac.cn
2014
Source PublicationAPPLIED OPTICS
ISSN1559-128X
Volume53Issue:16Pages:3370—3378
AbstractA modified method for measuring the absolute figure of a large optical flat surface in synchrotron radiation by a small aperture interferometer is presented. The method consists of two procedures: the first step is oblique incidence measurement; the second is multiple rotating measurements. This simple method is described in terms of functions that are symmetric or antisymmetric with respect to reflections at the vertical axis. Absolute deviations of a large flat surface could be obtained when mirror antisymmetric errors are removed by N-position rotational averaging. Formulas are derived for measuring the absolute surface errors of a rectangle flat, and experiments on high-accuracy rectangle flats are performed to verify the method. Finally, uncertainty analysis is carried out in detail. (C) 2014 Optical Society of America
KeywordLarge Flat Mirrors 3-flat Test Optics Reconstruction System
Indexed BySCI
Language英语
WOS IDWOS:000337502100006
Citation statistics
Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/14001
Collection中科院上海应用物理研究所2011-2019年
Corresponding Authorwangjie@sinap.ac.cn
Recommended Citation
GB/T 7714
Lin, WH,He, YM,Song, L,et al. Absolute surface metrology by rotational averaging in oblique incidence interferometry[J]. APPLIED OPTICS,2014,53(16):3370—3378.
APA Lin, WH,He, YM,Song, L,Luo, HX,Wang, J,&wangjie@sinap.ac.cn.(2014).Absolute surface metrology by rotational averaging in oblique incidence interferometry.APPLIED OPTICS,53(16),3370—3378.
MLA Lin, WH,et al."Absolute surface metrology by rotational averaging in oblique incidence interferometry".APPLIED OPTICS 53.16(2014):3370—3378.
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