CAS OpenIR  > 中科院上海应用物理研究所2011-2019年
Mechanism of force mode dip-pen nanolithography
Yang, HJ; Xie, H; Wu, HX; Rong, WB; Sun, LN; Guo, SW; Wang, HB; yanghaijun@sinap.ac.cn; swguo@sjtu.edu.cn; wanghuabin@cigit.ac.cn
2014
Source PublicationJOURNAL OF APPLIED PHYSICS
ISSN0021-8979
Volume115Issue:17
AbstractIn this work, the underlying mechanism of the force mode dip-pen nanolithography (FMDPN) is investigated in depth by analyzing force curves, tapping mode deflection signals, and "Z-scan" voltage variations during the FMDPN. The operation parameters including the relative "trigger threshold" and "surface delay" parameters are vital to control the loading force and dwell time for ink deposition during FMDPN. A model is also developed to simulate the interactions between the atomic force microscope tip and soft substrate during FMDPN, and verified by its good performance in fitting our experimental data. (C) 2014 AIP Publishing LLC.
KeywordCapillary Forces Tapping Mode Lithography Fabrication Oligonucleotides Microscopy Molecules Proteins Silver Ink
Indexed BySCI
Language英语
WOS IDWOS:000335643700645
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/14286
Collection中科院上海应用物理研究所2011-2019年
Corresponding Authoryanghaijun@sinap.ac.cn; swguo@sjtu.edu.cn; wanghuabin@cigit.ac.cn
Recommended Citation
GB/T 7714
Yang, HJ,Xie, H,Wu, HX,et al. Mechanism of force mode dip-pen nanolithography[J]. JOURNAL OF APPLIED PHYSICS,2014,115(17).
APA Yang, HJ.,Xie, H.,Wu, HX.,Rong, WB.,Sun, LN.,...&wanghuabin@cigit.ac.cn.(2014).Mechanism of force mode dip-pen nanolithography.JOURNAL OF APPLIED PHYSICS,115(17).
MLA Yang, HJ,et al."Mechanism of force mode dip-pen nanolithography".JOURNAL OF APPLIED PHYSICS 115.17(2014).
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