Knowledge Management System Of Shanghai Institute of Applied Physics, CAS
| Outgassing analysis of molecular glass photoresists under EUV irradiation | |
| Chen, L; Xu, J; Yuan, H; Yang, SM; Wang, LS; Wu, YQ; Zhao, J; Chen, M; Liu, HG; Li, SY; Tai, RZ; Wang, SQ; Yang, GQ; g1704@iccas.ac.cn; gqyang@iccas.ac.cn | |
| 2014 | |
| Source Publication | SCIENCE CHINA-CHEMISTRY
 |
| ISSN | 1674-7291 |
| Volume | 57Issue:12Pages:1746—1750 |
| Abstract | A device was designed and assembled to analyze the outgassing of molecular glass (MG) photoresists under extreme ultraviolet (EUV) exposure. The outgassing of the photoresists with different components and different concentrations of tert-butoxycarbonyl (t-Boc), photo-generated acid (PAG), and acid quencher was systematically investigated. Based on experiments, some solutions for reducing the outgassing of MG photoresists were proposed. |
| Keyword | Lithography |
| Indexed By | SCI |
| Language | 英语 |
| WOS ID | WOS:000346047500018 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.sinap.ac.cn/handle/331007/14296 |
| Collection | 中科院上海应用物理研究所2011-2020年 |
| Corresponding Author | g1704@iccas.ac.cn; gqyang@iccas.ac.cn |
| Recommended Citation GB/T 7714 | Chen, L,Xu, J,Yuan, H,et al. Outgassing analysis of molecular glass photoresists under EUV irradiation[J]. SCIENCE CHINA-CHEMISTRY,2014,57(12):1746—1750. |
| APA | Chen, L.,Xu, J.,Yuan, H.,Yang, SM.,Wang, LS.,...&gqyang@iccas.ac.cn.(2014).Outgassing analysis of molecular glass photoresists under EUV irradiation.SCIENCE CHINA-CHEMISTRY,57(12),1746—1750. |
| MLA | Chen, L,et al."Outgassing analysis of molecular glass photoresists under EUV irradiation".SCIENCE CHINA-CHEMISTRY 57.12(2014):1746—1750. |
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