CAS OpenIR  > 中科院上海应用物理研究所2011-2019年
Developments at SSRF in soft X-ray interference lithography
Yang, SM; Wang, LS; Zhao, J; Xue, CF; Liu, HG; Xu, ZJ; Wu, YQ; Tai, RZ
2015
Source PublicationNUCLEAR SCIENCE AND TECHNIQUES
Volume26Issue:1Pages:5—11
Subtype期刊文献
AbstractThe soft X-ray interference lithography (XIL) branch beamline at Shanghai Synchrotron Radiation Facility (SSRF) is briefly introduced in this article. It is designed for obtaining 1D (line/space) and 2D (dot/hole) periodic nanostructures by using two or more coherent extreme ultraviolet (EUV) beams from an undulator source. A transmission-diffraction-grating type of interferometer is used at the end station. Initial results reveal high performance of the beamline, with 50 nm half-pitch 1D and 2D patterns from a single exposure area of 400 mu m x 400 mu m. XIL is used in a growing number of areas, such as EUV resist test, surface enhanced Raman scattering (SERS) and color filter plasmonic devices. By using highly coherent EUV beam, broadband coherent diffractive imaging can be performed on the XIL beamline. Well reconstructed pinhole of phi 20 mu m has been realized.
KeywordInterferometric Lithography Gratings Beam Nanolithography
Indexed BySCI
Language英语
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/24428
Collection中科院上海应用物理研究所2011-2019年
Recommended Citation
GB/T 7714
Yang, SM,Wang, LS,Zhao, J,et al. Developments at SSRF in soft X-ray interference lithography[J]. NUCLEAR SCIENCE AND TECHNIQUES,2015,26(1):5—11.
APA Yang, SM.,Wang, LS.,Zhao, J.,Xue, CF.,Liu, HG.,...&Tai, RZ.(2015).Developments at SSRF in soft X-ray interference lithography.NUCLEAR SCIENCE AND TECHNIQUES,26(1),5—11.
MLA Yang, SM,et al."Developments at SSRF in soft X-ray interference lithography".NUCLEAR SCIENCE AND TECHNIQUES 26.1(2015):5—11.
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