Knowledge Management System Of Shanghai Institute of Applied Physics, CAS
Developments at SSRF in soft X-ray interference lithography | |
Yang, SM; Wang, LS; Zhao, J; Xue, CF; Liu, HG; Xu, ZJ; Wu, YQ; Tai, RZ | |
2015 | |
Source Publication | NUCLEAR SCIENCE AND TECHNIQUES
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Volume | 26Issue:1Pages:5—11 |
Subtype | 期刊文献 |
Abstract | The soft X-ray interference lithography (XIL) branch beamline at Shanghai Synchrotron Radiation Facility (SSRF) is briefly introduced in this article. It is designed for obtaining 1D (line/space) and 2D (dot/hole) periodic nanostructures by using two or more coherent extreme ultraviolet (EUV) beams from an undulator source. A transmission-diffraction-grating type of interferometer is used at the end station. Initial results reveal high performance of the beamline, with 50 nm half-pitch 1D and 2D patterns from a single exposure area of 400 mu m x 400 mu m. XIL is used in a growing number of areas, such as EUV resist test, surface enhanced Raman scattering (SERS) and color filter plasmonic devices. By using highly coherent EUV beam, broadband coherent diffractive imaging can be performed on the XIL beamline. Well reconstructed pinhole of phi 20 mu m has been realized. |
Keyword | Interferometric Lithography Gratings Beam Nanolithography |
Indexed By | SCI |
Language | 英语 |
Document Type | 期刊论文 |
Identifier | http://ir.sinap.ac.cn/handle/331007/24428 |
Collection | 中科院上海应用物理研究所2011-2020年 |
Recommended Citation GB/T 7714 | Yang, SM,Wang, LS,Zhao, J,et al. Developments at SSRF in soft X-ray interference lithography[J]. NUCLEAR SCIENCE AND TECHNIQUES,2015,26(1):5—11. |
APA | Yang, SM.,Wang, LS.,Zhao, J.,Xue, CF.,Liu, HG.,...&Tai, RZ.(2015).Developments at SSRF in soft X-ray interference lithography.NUCLEAR SCIENCE AND TECHNIQUES,26(1),5—11. |
MLA | Yang, SM,et al."Developments at SSRF in soft X-ray interference lithography".NUCLEAR SCIENCE AND TECHNIQUES 26.1(2015):5—11. |
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Developments at SSRF(1873KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Download |
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