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Enhanced light extraction of scintillator using large-area photonic crystal structures fabricated by soft-X-ray interference lithography
Zhu, ZC; Wu, S; Xue, CF; Zhao, J; Wang, LS; Wu, YQ; Liu, B; Cheng, CW; Gu, M; Chen, H; Tai, RZ
2015
Source PublicationAPPLIED PHYSICS LETTERS
Volume106Issue:24Pages:
Subtype期刊文献
AbstractSoft-X-ray interference lithography is utilized in combination with atomic layer deposition to prepare photonic crystal structures on the surface of Bi4Ge3O12 (BGO) scintillator in order to extract the light otherwise trapped in the internal of scintillator due to total internal reflection. An enhancement with wavelength-and emergence angle-integration by 95.1% has been achieved. This method is advantageous to fabricate photonic crystal structures with large-area and high-index-contrast which enable a high-efficient coupling of evanescent field and the photonic crystal structures. Generally, the method demonstrated in this work is also suitable for many other light emitting devices where a large-area is required in the practical applications. (C) 2015 AIP Publishing LLC.
KeywordAtomic Layer Deposition Lyso Scintillator Nanospheres Output
Indexed BySCI
Language英语
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/24454
Collection中科院上海应用物理研究所2011-2019年
Recommended Citation
GB/T 7714
Zhu, ZC,Wu, S,Xue, CF,et al. Enhanced light extraction of scintillator using large-area photonic crystal structures fabricated by soft-X-ray interference lithography[J]. APPLIED PHYSICS LETTERS,2015,106(24):—.
APA Zhu, ZC.,Wu, S.,Xue, CF.,Zhao, J.,Wang, LS.,...&Tai, RZ.(2015).Enhanced light extraction of scintillator using large-area photonic crystal structures fabricated by soft-X-ray interference lithography.APPLIED PHYSICS LETTERS,106(24),—.
MLA Zhu, ZC,et al."Enhanced light extraction of scintillator using large-area photonic crystal structures fabricated by soft-X-ray interference lithography".APPLIED PHYSICS LETTERS 106.24(2015):—.
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