CAS OpenIR  > 中科院上海应用物理研究所2011-2018年
Investigation of defects in sputtered W/B4C multilayers
Jiang, H; Yan, S; Zhu, JT; Dong, ZH; Zheng, Y; He, YM; Li, AG; Jiang, H (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai Synchrotron Radiat Facil, Zhangheng Rd 239, Shanghai 201204, Peoples R China.
2015
Source PublicationAPPLIED SURFACE SCIENCE
ISSN0169-4332
Volume357Pages:1180—1186
Subtype期刊文献
AbstractSputtered W/B4C multilayers were determined by X-ray photoelectron spectroscopy, Raman scattering spectroscopy, scanning electron microscopy and atomic force microscopy synthetically. Two defect modes were observed in multilayers: buckle delamination and oxidation. This paper compares the chemical composition varies along multilayer depth and at different regions and tries to interpret the mechanism of defect evolution. The X-ray grazing incidence reflection profiles were compared to the theoretical value to estimate the influences from different defects. (C) 2015 Elsevier B.V. All rights reserved.
KeywordAtomic-force Microscopy Optical Applications Diffuse-scattering Tungsten-oxide Thin-films Coatings Reflectivity Interface Cracking Stress
Language英语
WOS IDWOS:000366216900153
Citation statistics
Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/24971
Collection中科院上海应用物理研究所2011-2018年
Corresponding AuthorJiang, H (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai Synchrotron Radiat Facil, Zhangheng Rd 239, Shanghai 201204, Peoples R China.
Recommended Citation
GB/T 7714
Jiang, H,Yan, S,Zhu, JT,et al. Investigation of defects in sputtered W/B4C multilayers[J]. APPLIED SURFACE SCIENCE,2015,357:1180—1186.
APA Jiang, H.,Yan, S.,Zhu, JT.,Dong, ZH.,Zheng, Y.,...&Jiang, H .(2015).Investigation of defects in sputtered W/B4C multilayers.APPLIED SURFACE SCIENCE,357,1180—1186.
MLA Jiang, H,et al."Investigation of defects in sputtered W/B4C multilayers".APPLIED SURFACE SCIENCE 357(2015):1180—1186.
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