CAS OpenIR  > 中科院上海应用物理研究所2011-2018年
Development of broadband X-ray interference lithography large area exposure system
Xue, CF; Wu, YQ; Zhu, FY; Yang, SM; Liu, HG; Zhao, J; Wang, LS; Tai, RZ; Tai, RZ (reprint author), Chinese Acad Sci, Shanghai Synchrotron Radiat Facil, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China.
2016
Source PublicationREVIEW OF SCIENTIFIC INSTRUMENTS
ISSN0034-6748
Volume87Issue:4Pages:
Subtype期刊文献
AbstractThe single-exposure patterned area is about several 10(2) x 10(2) mu m(2) which is mainly decided by the mask area in multi-beam X-ray interference lithography (XIL). The exposure area is difficult to stitch to a larger one because the patterned area is surrounded by 0th diffraction exposure areas. To block the 0th diffraction beams precisely and effectively, a new large area exposure technology is developed in the Shanghai Synchrotron Radiation Facility by applying an order-sorting aperture with a new in situ monitoring scheme in the XIL system. The patterned area could be stitched readily up to several square centimeters and even bigger by this technology. Published by AIP Publishing.
KeywordInterferometric Lithography High-resolution Fabrication Arrays Grids Light
DOI10.1063/1.4947067
Indexed BySCI
Language英语
WOS IDWOS:000375842500023
Citation statistics
Cited Times:6[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/25683
Collection中科院上海应用物理研究所2011-2018年
Corresponding AuthorWu, YQ; Zhao, J; Tai, RZ (reprint author), Chinese Acad Sci, Shanghai Synchrotron Radiat Facil, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China.
Recommended Citation
GB/T 7714
Xue, CF,Wu, YQ,Zhu, FY,et al. Development of broadband X-ray interference lithography large area exposure system[J]. REVIEW OF SCIENTIFIC INSTRUMENTS,2016,87(4):—.
APA Xue, CF.,Wu, YQ.,Zhu, FY.,Yang, SM.,Liu, HG.,...&Tai, RZ .(2016).Development of broadband X-ray interference lithography large area exposure system.REVIEW OF SCIENTIFIC INSTRUMENTS,87(4),—.
MLA Xue, CF,et al."Development of broadband X-ray interference lithography large area exposure system".REVIEW OF SCIENTIFIC INSTRUMENTS 87.4(2016):—.
Files in This Item: Download All
File Name/Size DocType Version Access License
Development of broad(3963KB)期刊论文作者接受稿开放获取CC BY-NC-SAView Download
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Xue, CF]'s Articles
[Wu, YQ]'s Articles
[Zhu, FY]'s Articles
Baidu academic
Similar articles in Baidu academic
[Xue, CF]'s Articles
[Wu, YQ]'s Articles
[Zhu, FY]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Xue, CF]'s Articles
[Wu, YQ]'s Articles
[Zhu, FY]'s Articles
Terms of Use
No data!
Social Bookmark/Share
File name: Development of broadband X-ray interference lithography large area exposure system.pdf
Format: Adobe PDF
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.