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题名:
Electrochemical behavior of Th(IV) and its electrodeposition from ThF4-LiCl-KCl melt
作者: Wang, XB; Huang, W; Gong, Y; Jiang, F; Zheng, HY; Zhu, TJ; Long, DW; Li, QN
刊名: ELECTROCHIMICA ACTA
出版日期: 2016
卷号: 196, 期号:-, 页码:286—293
关键词: KCL EUTECTIC MELTS ; MOLTEN LICL-KCL ; LIF-NAF-KF ; THORIUM FLUORIDE ; NUCLEAR-FUEL ; REDUCTION ; SALT ; ALLOYS ; THO2 ; IONS
DOI: 10.1016/j.electacta.2016.02.184
通讯作者: Long, DW ; Li, QN (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China. ; Long, DW ; Li, QN (reprint author), Chinese Acad Sci, Key Lab Nucl Radiat & Nucl Energy Technol, Shanghai 201800, Peoples R China. ; Long, DW ; Li, QN (reprint author), Chinese Acad Sci, Ctr Excellence TMSR Energy Syst, Shanghai 201800, Peoples R China.
文章类型: 期刊文献
英文摘要: The electrochemical behavior of Th(IV) ion on molybdenum (Mo) electrode was studied by cyclic voltammetry (CV) and square wave voltammetry (SWV) technologies at 773 K in ThF4-LiCl-KCl melt. The reduction of Th(IV) to metal Th at -1.67 V (vs. Ag/AgCl) is a four-electron exchange process, which is quasi-reversible and diffusion-controlled. The diffusion coefficient (D) and activation energy of diffusion process for Th(IV) were determined to be 3.77 x 10 (5) cm(2) s (1) and 59.2 kJ mol (1). The pulse potential electrolysis of ThF4-LiCl-KCl melt revealed that 86.8% of Th(IV) can be separated from the melt based on the inductively coupled plasma atomic emission spectrometer (ICP-AES) results. (C) 2016 Elsevier Ltd. All rights reserved.
收录类别: SCI
语种: 英语
WOS记录号: WOS:000372877400032
ISSN号: 0013-4686
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.sinap.ac.cn/handle/331007/25706
Appears in Collections:中科院上海应用物理研究所2011-2017年_期刊论文

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Recommended Citation:
Wang, XB,Huang, W,Gong, Y,et al. Electrochemical behavior of Th(IV) and its electrodeposition from ThF4-LiCl-KCl melt[J]. ELECTROCHIMICA ACTA,2016-01-01,196(-):286—293.
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文件名: Electrochemical behavior of Th(IV) and its electrodeposition from ThF4-LiCl-KCl melt.pdf
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