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Electrochemical behavior of Th(IV) and its electrodeposition from ThF4-LiCl-KCl melt
Wang, XB; Huang, W; Gong, Y; Jiang, F; Zheng, HY; Zhu, TJ; Long, DW; Li, QN; Li, QN (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China.; Li, QN (reprint author), Chinese Acad Sci, Key Lab Nucl Radiat & Nucl Energy Technol, Shanghai 201800, Peoples R China.; Li, QN (reprint author), Chinese Acad Sci, Ctr Excellence TMSR Energy Syst, Shanghai 201800, Peoples R China.
2016
Source PublicationELECTROCHIMICA ACTA
ISSN0013-4686
Volume196Issue:-Pages:286—293
Subtype期刊文献
AbstractThe electrochemical behavior of Th(IV) ion on molybdenum (Mo) electrode was studied by cyclic voltammetry (CV) and square wave voltammetry (SWV) technologies at 773 K in ThF4-LiCl-KCl melt. The reduction of Th(IV) to metal Th at -1.67 V (vs. Ag/AgCl) is a four-electron exchange process, which is quasi-reversible and diffusion-controlled. The diffusion coefficient (D) and activation energy of diffusion process for Th(IV) were determined to be 3.77 x 10 (5) cm(2) s (1) and 59.2 kJ mol (1). The pulse potential electrolysis of ThF4-LiCl-KCl melt revealed that 86.8% of Th(IV) can be separated from the melt based on the inductively coupled plasma atomic emission spectrometer (ICP-AES) results. (C) 2016 Elsevier Ltd. All rights reserved.
KeywordKcl Eutectic Melts Molten Licl-kcl Lif-naf-kf Thorium Fluoride Nuclear-fuel Reduction Salt Alloys Tho2 Ions
DOI10.1016/j.electacta.2016.02.184
Indexed BySCI
Language英语
WOS IDWOS:000372877400032
Citation statistics
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/25706
Collection中科院上海应用物理研究所2011-2018年
Corresponding AuthorLong, DW; Li, QN (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China.; Li, QN (reprint author), Chinese Acad Sci, Key Lab Nucl Radiat & Nucl Energy Technol, Shanghai 201800, Peoples R China.; Li, QN (reprint author), Chinese Acad Sci, Ctr Excellence TMSR Energy Syst, Shanghai 201800, Peoples R China.
Recommended Citation
GB/T 7714
Wang, XB,Huang, W,Gong, Y,et al. Electrochemical behavior of Th(IV) and its electrodeposition from ThF4-LiCl-KCl melt[J]. ELECTROCHIMICA ACTA,2016,196(-):286—293.
APA Wang, XB.,Huang, W.,Gong, Y.,Jiang, F.,Zheng, HY.,...&Li, QN .(2016).Electrochemical behavior of Th(IV) and its electrodeposition from ThF4-LiCl-KCl melt.ELECTROCHIMICA ACTA,196(-),286—293.
MLA Wang, XB,et al."Electrochemical behavior of Th(IV) and its electrodeposition from ThF4-LiCl-KCl melt".ELECTROCHIMICA ACTA 196.-(2016):286—293.
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