CAS OpenIR  > 中科院上海应用物理研究所2011-2019年
ALD-coated ultrathin Al2O3 film on BiVO4 nanoparticles for efficient PEC water splitting
Chang, GL; Wang, DG; Zhang, YY; Aldalbahi, A; Wang, LH; Li, Q; Wang, K; Wang, K (reprint author), Chinese Acad Sci, CAS Key Lab Interfacial Phys & Technol, Shanghai Synchrotron Radiat Facil, Shanghai Inst Appl Phys,Div Phys Biol, Shanghai 201800, Peoples R China.; Wang, K (reprint author), Chinese Acad Sci, CAS Key Lab Interfacial Phys & Technol, Shanghai Synchrotron Radiat Facil, Shanghai Inst Appl Phys,Bioimaging Ctr, Shanghai 201800, Peoples R China.
2016
Source PublicationNUCLEAR SCIENCE AND TECHNIQUES
ISSN1001-8042
Volume27Issue:5Pages:-
Subtype期刊论文
AbstractBismuth vanadate (BiVO4) is a promising semiconductor material for solar energy conversion via photoelectrochemical (PEC) water splitting, whereas its performance is limited by surface recombination due to trapping states. Herein, we developed a new method to passivate the trapping states on BiVO4 surface using ultrathin aluminum oxide (Al2O3) overlayer by atomic layer deposition. The coated ultrathin Al2O3 film on BiVO4 significantly enhanced photocurrent densities of the BiVO4 anodes under standard illumination of AM 1.5 G (100 mW/cm(2)). The electrochemical impedances and photoluminescence spectra were studied to confirm that the improved PEC water splitting performance of BiVO4 was due to the decreased surface recombination state on BiVO4, which effectively enhanced the charge separation.
KeywordUltrathin Al2o3 Overlayer Photoelectrochemical Water Splitting Surface State Atomic Layer Deposition
DOI10.1007/s41365-016-0122-6
Indexed BySCI
Language英语
WOS IDWOS:000388510700005
Citation statistics
Cited Times:9[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/26423
Collection中科院上海应用物理研究所2011-2019年
Corresponding AuthorWang, K (reprint author), Chinese Acad Sci, CAS Key Lab Interfacial Phys & Technol, Shanghai Synchrotron Radiat Facil, Shanghai Inst Appl Phys,Div Phys Biol, Shanghai 201800, Peoples R China.; Wang, K (reprint author), Chinese Acad Sci, CAS Key Lab Interfacial Phys & Technol, Shanghai Synchrotron Radiat Facil, Shanghai Inst Appl Phys,Bioimaging Ctr, Shanghai 201800, Peoples R China.
Recommended Citation
GB/T 7714
Chang, GL,Wang, DG,Zhang, YY,et al. ALD-coated ultrathin Al2O3 film on BiVO4 nanoparticles for efficient PEC water splitting[J]. NUCLEAR SCIENCE AND TECHNIQUES,2016,27(5):-.
APA Chang, GL.,Wang, DG.,Zhang, YY.,Aldalbahi, A.,Wang, LH.,...&Wang, K .(2016).ALD-coated ultrathin Al2O3 film on BiVO4 nanoparticles for efficient PEC water splitting.NUCLEAR SCIENCE AND TECHNIQUES,27(5),-.
MLA Chang, GL,et al."ALD-coated ultrathin Al2O3 film on BiVO4 nanoparticles for efficient PEC water splitting".NUCLEAR SCIENCE AND TECHNIQUES 27.5(2016):-.
Files in This Item:
File Name/Size DocType Version Access License
ALD-coated ultrathin(1223KB)期刊论文作者接受稿开放获取CC BY-NC-SAView Application Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Chang, GL]'s Articles
[Wang, DG]'s Articles
[Zhang, YY]'s Articles
Baidu academic
Similar articles in Baidu academic
[Chang, GL]'s Articles
[Wang, DG]'s Articles
[Zhang, YY]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Chang, GL]'s Articles
[Wang, DG]'s Articles
[Zhang, YY]'s Articles
Terms of Use
No data!
Social Bookmark/Share
File name: ALD-coated ultrathin Al2O3 film on BiVO4 nanoparticles for efficient PEC water splitting.pdf
Format: Adobe PDF
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.