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题名:
ALD-coated ultrathin Al2O3 film on BiVO4 nanoparticles for efficient PEC water splitting
作者: Chang, GL; Wang, DG; Zhang, YY; Aldalbahi, A; Wang, LH; Li, Q; Wang, K
刊名: NUCLEAR SCIENCE AND TECHNIQUES
出版日期: 2016
卷号: 27, 期号:5, 页码:-
关键词: Ultrathin Al2O3 overlayer ; Photoelectrochemical water splitting ; Surface state ; Atomic layer deposition
DOI: 10.1007/s41365-016-0122-6
通讯作者: Wang, K (reprint author), Chinese Acad Sci, CAS Key Lab Interfacial Phys & Technol, Shanghai Synchrotron Radiat Facil, Shanghai Inst Appl Phys,Div Phys Biol, Shanghai 201800, Peoples R China. ; Wang, K (reprint author), Chinese Acad Sci, CAS Key Lab Interfacial Phys & Technol, Shanghai Synchrotron Radiat Facil, Shanghai Inst Appl Phys,Bioimaging Ctr, Shanghai 201800, Peoples R China.
文章类型: 期刊论文
英文摘要: Bismuth vanadate (BiVO4) is a promising semiconductor material for solar energy conversion via photoelectrochemical (PEC) water splitting, whereas its performance is limited by surface recombination due to trapping states. Herein, we developed a new method to passivate the trapping states on BiVO4 surface using ultrathin aluminum oxide (Al2O3) overlayer by atomic layer deposition. The coated ultrathin Al2O3 film on BiVO4 significantly enhanced photocurrent densities of the BiVO4 anodes under standard illumination of AM 1.5 G (100 mW/cm(2)). The electrochemical impedances and photoluminescence spectra were studied to confirm that the improved PEC water splitting performance of BiVO4 was due to the decreased surface recombination state on BiVO4, which effectively enhanced the charge separation.
收录类别: SCI
语种: 英语
WOS记录号: WOS:000388510700005
ISSN号: 1001-8042
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.sinap.ac.cn/handle/331007/26423
Appears in Collections:中科院上海应用物理研究所2011-2017年_期刊论文

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Recommended Citation:
Chang, GL,Wang, DG,Zhang, YY,et al. ALD-coated ultrathin Al2O3 film on BiVO4 nanoparticles for efficient PEC water splitting[J]. NUCLEAR SCIENCE AND TECHNIQUES,2016-01-01,27(5):-.
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