CAS OpenIR  > 中科院上海应用物理研究所2011-2018年
High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography
Sun, LB; Hu, XL; Wu, QJ; Wang, LS; Zhao, J; Yang, SM; Tai, RZ; Fecht, HJ; Zhang, DX; Wang, LQ; Jiang, JZ; Wang, LQ (reprint author), Zhejiang Univ, State Key Lab Modern Opt Instrumentat, Hangzhou 310027, Zhejiang, Peoples R China.; Jiang, JZ (reprint author), Zhejiang Univ, Int Ctr New Struct Mat, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China.; Jiang, JZ (reprint author), Zhejiang Univ, Sch Mat Sci & Engn, Hangzhou 310027, Zhejiang, Peoples R China.
2016
Source PublicationOPTICS EXPRESS
ISSN1094-4087
Volume24Issue:17Pages:19112-19121
Subtype期刊论文
AbstractPlasmonic color filters in mass production have been restricted from current fabrication technology, which impede their applications. Soft-X-ray interference lithography (XIL) has recently generated considerable interest as a newly developed technique for the production of periodic nano-structures with resolution theoretically below 4 nm. Here we ameliorate XIL by adding an order sorting aperture and designing the light path properly to achieve perfect-stitching nano-patterns and fast fabrication of large-area color filters. The fill factor of nanostructures prepared on ultrathin Ag films can largely affect the transmission minimum of plasmonic color filters. By changing the fill factor, the color can be controlled flexibly, improving the utilization efficiency of the mask in XIL simultaneously. The calculated data agree well with the experimental results. Finally, an underlying mechanism has been uncovered after systematically analyzing the localized surface plasmon polaritons (LSPPs) coupling in electric field distribution. (C) 2016 Optical Society of America
DOI10.1364/OE.24.019112
Indexed BySCI
Language英语
WOS IDWOS:000385227100025
Citation statistics
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/26529
Collection中科院上海应用物理研究所2011-2018年
Corresponding AuthorZhang, DX; Wang, LQ (reprint author), Zhejiang Univ, State Key Lab Modern Opt Instrumentat, Hangzhou 310027, Zhejiang, Peoples R China.; Jiang, JZ (reprint author), Zhejiang Univ, Int Ctr New Struct Mat, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China.; Jiang, JZ (reprint author), Zhejiang Univ, Sch Mat Sci & Engn, Hangzhou 310027, Zhejiang, Peoples R China.
Recommended Citation
GB/T 7714
Sun, LB,Hu, XL,Wu, QJ,et al. High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography[J]. OPTICS EXPRESS,2016,24(17):19112-19121.
APA Sun, LB.,Hu, XL.,Wu, QJ.,Wang, LS.,Zhao, J.,...&Jiang, JZ .(2016).High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography.OPTICS EXPRESS,24(17),19112-19121.
MLA Sun, LB,et al."High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography".OPTICS EXPRESS 24.17(2016):19112-19121.
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