中国科学院上海应用物理研究所机构知识库
Advanced  
CAS OpenIR  > 中科院上海应用物理研究所2011-2017年  > 期刊论文
题名:
High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography
作者: Sun, LB; Hu, XL; Wu, QJ; Wang, LS; Zhao, J; Yang, SM; Tai, RZ; Fecht, HJ; Zhang, DX; Wang, LQ; Jiang, JZ
刊名: OPTICS EXPRESS
出版日期: 2016
卷号: 24, 期号:17, 页码:19112-19121
DOI: 10.1364/OE.24.019112
通讯作者: Zhang, DX ; Wang, LQ (reprint author), Zhejiang Univ, State Key Lab Modern Opt Instrumentat, Hangzhou 310027, Zhejiang, Peoples R China. ; Jiang, JZ (reprint author), Zhejiang Univ, Int Ctr New Struct Mat, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China. ; Jiang, JZ (reprint author), Zhejiang Univ, Sch Mat Sci & Engn, Hangzhou 310027, Zhejiang, Peoples R China.
文章类型: 期刊论文
英文摘要: Plasmonic color filters in mass production have been restricted from current fabrication technology, which impede their applications. Soft-X-ray interference lithography (XIL) has recently generated considerable interest as a newly developed technique for the production of periodic nano-structures with resolution theoretically below 4 nm. Here we ameliorate XIL by adding an order sorting aperture and designing the light path properly to achieve perfect-stitching nano-patterns and fast fabrication of large-area color filters. The fill factor of nanostructures prepared on ultrathin Ag films can largely affect the transmission minimum of plasmonic color filters. By changing the fill factor, the color can be controlled flexibly, improving the utilization efficiency of the mask in XIL simultaneously. The calculated data agree well with the experimental results. Finally, an underlying mechanism has been uncovered after systematically analyzing the localized surface plasmon polaritons (LSPPs) coupling in electric field distribution. (C) 2016 Optical Society of America
收录类别: SCI
语种: 英语
WOS记录号: WOS:000385227100025
ISSN号: 1094-4087
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.sinap.ac.cn/handle/331007/26529
Appears in Collections:中科院上海应用物理研究所2011-2017年_期刊论文

Files in This Item: Download All
File Name/ File Size Content Type Version Access License
High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography.pdf(4208KB)期刊论文作者接受稿开放获取View Download

Recommended Citation:
Sun, LB,Hu, XL,Wu, QJ,et al. High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography[J]. OPTICS EXPRESS,2016-01-01,24(17):19112-19121.
Service
Recommend this item
Sava as my favorate item
Show this item's statistics
Export Endnote File
Google Scholar
Similar articles in Google Scholar
[Sun, LB]'s Articles
[Hu, XL]'s Articles
[Wu, QJ]'s Articles
CSDL cross search
Similar articles in CSDL Cross Search
[Sun, LB]‘s Articles
[Hu, XL]‘s Articles
[Wu, QJ]‘s Articles
Related Copyright Policies
Null
Social Bookmarking
Add to CiteULike Add to Connotea Add to Del.icio.us Add to Digg Add to Reddit
文件名: High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography.pdf
格式: Adobe PDF
所有评论 (0)
暂无评论
 
评注功能仅针对注册用户开放,请您登录
您对该条目有什么异议,请填写以下表单,管理员会尽快联系您。
内 容:
Email:  *
单位:
验证码:   刷新
您在IR的使用过程中有什么好的想法或者建议可以反馈给我们。
标 题:
 *
内 容:
Email:  *
验证码:   刷新

Items in IR are protected by copyright, with all rights reserved, unless otherwise indicated.

 

 

Valid XHTML 1.0!
Powered by CSpace