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CAS OpenIR  > 中科院上海应用物理研究所2011-2017年  > 期刊论文
题名:
Ultrahigh precision low-cost pinpointed SiO2 patterns nanofabrication by using traditional MEMS fabrication processes
作者: Dai, PF; Zhang, HL; Chao, J; Fan, CH; Wang, YL; Li, T
刊名: MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS
出版日期: 2016
卷号: 22, 期号:8, 页码:2101-2107
DOI: 10.1007/s00542-015-2600-x
通讯作者: Li, T (reprint author), Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Sci & Technol Microsyst Lab, Shanghai 200050, Peoples R China.
文章类型: 期刊论文
英文摘要: Recent years, nanoscale patterns transfer technique from DNA origami molecules to SiO2 layer has been a promising approach of silicon based nanofabrication process. However, researchers find it difficult to locate SiO2 nano patterns with origami's shapes. Here, we present a novel and low-cost approach of ultrahigh precision SiO2 patterns nanofabrication in target position. Traditional contact lithography process is used to fabricate nanoscale silicon oxide islands array in this paper, which are used to pinpoint the position of ultrahigh precision nano patterns. Precise controllability sacrificial layer etching is the key process to realize nanoscale control of islands in process. This fabrication method is a simple and cost-effective method with high yield, which will hopefully make contributions for higher precision nanofabrication technology in the future.
收录类别: SCI
语种: 英语
WOS记录号: WOS:000380121700019
ISSN号: 0946-7076
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.sinap.ac.cn/handle/331007/26672
Appears in Collections:中科院上海应用物理研究所2011-2017年_期刊论文

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Recommended Citation:
Dai, PF,Zhang, HL,Chao, J,et al. Ultrahigh precision low-cost pinpointed SiO2 patterns nanofabrication by using traditional MEMS fabrication processes[J]. MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS,2016-01-01,22(8):2101-2107.
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