CAS OpenIR  > 中科院上海应用物理研究所2011-2018年
Ultrahigh precision low-cost pinpointed SiO2 patterns nanofabrication by using traditional MEMS fabrication processes
Dai, PF; Zhang, HL; Chao, J; Fan, CH; Wang, YL; Li, T; Li, T (reprint author), Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Sci & Technol Microsyst Lab, Shanghai 200050, Peoples R China.
2016
Source PublicationMICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS
ISSN0946-7076
Volume22Issue:8Pages:2101-2107
Subtype期刊论文
AbstractRecent years, nanoscale patterns transfer technique from DNA origami molecules to SiO2 layer has been a promising approach of silicon based nanofabrication process. However, researchers find it difficult to locate SiO2 nano patterns with origami's shapes. Here, we present a novel and low-cost approach of ultrahigh precision SiO2 patterns nanofabrication in target position. Traditional contact lithography process is used to fabricate nanoscale silicon oxide islands array in this paper, which are used to pinpoint the position of ultrahigh precision nano patterns. Precise controllability sacrificial layer etching is the key process to realize nanoscale control of islands in process. This fabrication method is a simple and cost-effective method with high yield, which will hopefully make contributions for higher precision nanofabrication technology in the future.
DOI10.1007/s00542-015-2600-x
Indexed BySCI
Language英语
WOS IDWOS:000380121700019
Citation statistics
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/26672
Collection中科院上海应用物理研究所2011-2018年
Corresponding AuthorLi, T (reprint author), Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Sci & Technol Microsyst Lab, Shanghai 200050, Peoples R China.
Recommended Citation
GB/T 7714
Dai, PF,Zhang, HL,Chao, J,et al. Ultrahigh precision low-cost pinpointed SiO2 patterns nanofabrication by using traditional MEMS fabrication processes[J]. MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS,2016,22(8):2101-2107.
APA Dai, PF.,Zhang, HL.,Chao, J.,Fan, CH.,Wang, YL.,...&Li, T .(2016).Ultrahigh precision low-cost pinpointed SiO2 patterns nanofabrication by using traditional MEMS fabrication processes.MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS,22(8),2101-2107.
MLA Dai, PF,et al."Ultrahigh precision low-cost pinpointed SiO2 patterns nanofabrication by using traditional MEMS fabrication processes".MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS 22.8(2016):2101-2107.
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