Knowledge Management System Of Shanghai Institute of Applied Physics, CAS
| Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography | |
| Zhao, J; Wu, YQ; Xue, CF; Yang, SM; Wang, LS; Zhu, FY; Zhu, ZC; Liu, B; Wang, Y; Tai, RZ | |
| 2017 | |
| Source Publication | MICROELECTRONIC ENGINEERING
 |
| ISSN | 0167-9317 |
| Volume | 170Pages:49-53 |
| Subtype | 期刊论文 |
| Abstract | Nanoscale periodic structures have been utilized in the scintillator field to obtain enhanced light extraction efficiency. Sufficient structure depth is necessary to achieve better extraction efficiency. Recently, a soft X-ray interference lithography (SXIL) has been developed in the Shanghai Synchrotron Radiation Facility (SSRF). SXIL can be used to fabricate a high aspect ratio pattern due to the uniform distribution Of the beam dose at the photoresist depth. A grating mask with a new photon stop layer was attempted, mainly Consisting of Perm alloy, and it was optimized for the SXIL to increase the entire service life. Preliminary results suggest that PMMA structure with an aspect ratio of up to 3 has been successfully manufactured using SXIL techniques. Therefore, this technique has been studied to fabricate the artificial nanostructure on the scintillator in the high efficiency radiation detector area. (C) 2016 Elsevier B.V. All rights reserved. |
| Keyword | Periodic Structures Scintillator Soft X-ray Interference Lithography High Aspect Ratio |
| DOI | 10.1016/j.mee.2016.12.028 |
| Indexed By | SCI |
| Language | 英语 |
| WOS ID | WOS:000393936400009 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.sinap.ac.cn/handle/331007/27322 |
| Collection | 中科院上海应用物理研究所2011-2020年 |
| Recommended Citation GB/T 7714 | Zhao, J,Wu, YQ,Xue, CF,et al. Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography[J]. MICROELECTRONIC ENGINEERING,2017,170:49-53. |
| APA | Zhao, J.,Wu, YQ.,Xue, CF.,Yang, SM.,Wang, LS.,...&Tai, RZ.(2017).Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography.MICROELECTRONIC ENGINEERING,170,49-53. |
| MLA | Zhao, J,et al."Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography".MICROELECTRONIC ENGINEERING 170(2017):49-53. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| Fabrication of high （783KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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