CAS OpenIR  > 中科院上海应用物理研究所2011-2018年
Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography
Zhao, J; Wu, YQ; Xue, CF; Yang, SM; Wang, LS; Zhu, FY; Zhu, ZC; Liu, B; Wang, Y; Tai, RZ
2017
Source PublicationMICROELECTRONIC ENGINEERING
ISSN0167-9317
Volume170Pages:49-53
Subtype期刊论文
AbstractNanoscale periodic structures have been utilized in the scintillator field to obtain enhanced light extraction efficiency. Sufficient structure depth is necessary to achieve better extraction efficiency. Recently, a soft X-ray interference lithography (SXIL) has been developed in the Shanghai Synchrotron Radiation Facility (SSRF). SXIL can be used to fabricate a high aspect ratio pattern due to the uniform distribution Of the beam dose at the photoresist depth. A grating mask with a new photon stop layer was attempted, mainly Consisting of Perm alloy, and it was optimized for the SXIL to increase the entire service life. Preliminary results suggest that PMMA structure with an aspect ratio of up to 3 has been successfully manufactured using SXIL techniques. Therefore, this technique has been studied to fabricate the artificial nanostructure on the scintillator in the high efficiency radiation detector area. (C) 2016 Elsevier B.V. All rights reserved.
KeywordPeriodic Structures Scintillator Soft X-ray Interference Lithography High Aspect Ratio
DOI10.1016/j.mee.2016.12.028
Indexed BySCI
Language英语
WOS IDWOS:000393936400009
Citation statistics
Cited Times:8[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/27322
Collection中科院上海应用物理研究所2011-2018年
Recommended Citation
GB/T 7714
Zhao, J,Wu, YQ,Xue, CF,et al. Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography[J]. MICROELECTRONIC ENGINEERING,2017,170:49-53.
APA Zhao, J.,Wu, YQ.,Xue, CF.,Yang, SM.,Wang, LS.,...&Tai, RZ.(2017).Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography.MICROELECTRONIC ENGINEERING,170,49-53.
MLA Zhao, J,et al."Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography".MICROELECTRONIC ENGINEERING 170(2017):49-53.
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