Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography
Yang, SM; Zhao, J; Wang, LS; Zhu, FY; Xue, CF; Liu, HG; Sang, HZ; Wu, YQ; Tai, RZ
2017
发表期刊JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN1071-1023
卷号35期号:2页码:-
文章类型期刊论文
摘要Achromatic Talbot lithography has been proved as a robust and high throughput technique for large area nanopatterning with controllable feature sizes and duty cycles. In this work, the influence of symmetry and duty cycles on the pattern generation has been investigated in detail. Compared with square lattice case, no lattice rotation and spatial frequency multiplication can be observed in hexagonal nanopattern generation. Uniform pattern distribution with a 20 nm feature size has been obtained in square and hexagonal lattices by the masks with 144 nm period and similar to 50% duty cycle. For the exposure of mask with a smaller duty cycle, nonuniform dot size distribution has been obtained in the square lattice. While, by using a smaller duty cycle hexagonal lattice mask, a highly uniform periodic hexagonal nanopattern with a 10% duty cycle has been obtained. All the experimental results were consistent with the simulation work. (C) 2017 American Vacuum Society.
DOI10.1116/1.4974930
收录类别SCI
语种英语
WOS记录号WOS:000397858500043
引用统计
文献类型期刊论文
条目标识符http://ir.sinap.ac.cn/handle/331007/27351
专题中科院上海应用物理研究所2011-2018年
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GB/T 7714
Yang, SM,Zhao, J,Wang, LS,et al. Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,2017,35(2):-.
APA Yang, SM.,Zhao, J.,Wang, LS.,Zhu, FY.,Xue, CF.,...&Tai, RZ.(2017).Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,35(2),-.
MLA Yang, SM,et al."Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 35.2(2017):-.
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