CAS OpenIR  > 中科院上海应用物理研究所2011-2018年
Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography
Yang, SM; Zhao, J; Wang, LS; Zhu, FY; Xue, CF; Liu, HG; Sang, HZ; Wu, YQ; Tai, RZ
2017
Source PublicationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN1071-1023
Volume35Issue:2Pages:-
Subtype期刊论文
AbstractAchromatic Talbot lithography has been proved as a robust and high throughput technique for large area nanopatterning with controllable feature sizes and duty cycles. In this work, the influence of symmetry and duty cycles on the pattern generation has been investigated in detail. Compared with square lattice case, no lattice rotation and spatial frequency multiplication can be observed in hexagonal nanopattern generation. Uniform pattern distribution with a 20 nm feature size has been obtained in square and hexagonal lattices by the masks with 144 nm period and similar to 50% duty cycle. For the exposure of mask with a smaller duty cycle, nonuniform dot size distribution has been obtained in the square lattice. While, by using a smaller duty cycle hexagonal lattice mask, a highly uniform periodic hexagonal nanopattern with a 10% duty cycle has been obtained. All the experimental results were consistent with the simulation work. (C) 2017 American Vacuum Society.
DOI10.1116/1.4974930
Indexed BySCI
Language英语
WOS IDWOS:000397858500043
Citation statistics
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/27351
Collection中科院上海应用物理研究所2011-2018年
Recommended Citation
GB/T 7714
Yang, SM,Zhao, J,Wang, LS,et al. Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,2017,35(2):-.
APA Yang, SM.,Zhao, J.,Wang, LS.,Zhu, FY.,Xue, CF.,...&Tai, RZ.(2017).Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,35(2),-.
MLA Yang, SM,et al."Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 35.2(2017):-.
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