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| Investigating the influence of F- on U4+ in molten LiCl-KCl-UF4 system and electro-deposition of U | |
| Zhu, TJ; Huang, W; Zheng, HY; She, CF; Jiang, F; Wang, XB; Yu, G; Long, DW; Li, QN | |
| 2017 | |
| Source Publication | JOURNAL OF RADIOANALYTICAL AND NUCLEAR CHEMISTRY
 |
| ISSN | 1588-2780 |
| Volume | 3Pages:485- |
| Subtype | 期刊论文 |
| Abstract | Electrochemical behaviors of U4+ in LiCl-KCl-UF4 eutectic and deposition of U metal were investigated. It was found that the presence of F- has influence on the diffusion of U3+ and U4+ as comparing to data obtained in pure chloride molten salts. Electrochemical deposition of U was carried out by using pulse current electrolysis. Characterization results indicate that U metal was obtained at the cathode, implying U metal can be directly deposited from LiCl-KCl-UF4 eutectic in this case and the extractive ratio is calculated to be 98%. Our results demonstrate feasible separation of U from LiCl-KCl-UF4 molten salt by electrochemical method. |
| Keyword | F- Influence Uranium Ion Licl-kcl Molten Salt Spent Fuel |
| Indexed By | SCI |
| Language | 英语 |
| Document Type | 期刊论文 |
| Identifier | http://ir.sinap.ac.cn/handle/331007/27358 |
| Collection | 中科院上海应用物理研究所2011-2019年 |
| Recommended Citation GB/T 7714 | Zhu, TJ,Huang, W,Zheng, HY,et al. Investigating the influence of F- on U4+ in molten LiCl-KCl-UF4 system and electro-deposition of U[J]. JOURNAL OF RADIOANALYTICAL AND NUCLEAR CHEMISTRY,2017,3:485-. |
| APA | Zhu, TJ.,Huang, W.,Zheng, HY.,She, CF.,Jiang, F.,...&Li, QN.(2017).Investigating the influence of F- on U4+ in molten LiCl-KCl-UF4 system and electro-deposition of U.JOURNAL OF RADIOANALYTICAL AND NUCLEAR CHEMISTRY,3,485-. |
| MLA | Zhu, TJ,et al."Investigating the influence of F- on U4+ in molten LiCl-KCl-UF4 system and electro-deposition of U".JOURNAL OF RADIOANALYTICAL AND NUCLEAR CHEMISTRY 3(2017):485-. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| Investigating the in（913KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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