Nanofabrication and characterization of a grating-based condenser for uniform illumination with hard X-rays
Liu, JP; Li, X; Chen, S; Zhang, SC; Xie, SS; Xu, C; Chen, YF; Deng, B; Mao, CW
2017
发表期刊JOURNAL OF SYNCHROTRON RADIATION
ISSN1600-5775
卷号24页码:595-599
文章类型期刊论文
摘要In the development of full-field transmission X-ray microscopy for basic study in science and technology, a condenser capable of providing intense illumination with high uniformity and stability on tested specimens in order to achieve high-quality images is essential. The latest design of a square-shaped condenser based on diffractive gratings has demonstrated promising uniformity in illumination. This paper describes in more detail the development of such a beam shaper for hard X-rays at 10keV with regard to its design, manufacture and optical characterization. The effect of the grating profile on the diffracted intensity has been theoretically predicted by numerical simulation using the finite-difference time-domain method. Based on this, the limitations of the grating-based condenser are discussed.
关键词Condenser Uniform Illumination Gratings Nanofabrication Hard X-ray Optics
DOI10.1107/S1600577517002247
收录类别SCI
语种英语
WOS记录号WOS:000400385400006
引用统计
文献类型期刊论文
条目标识符http://ir.sinap.ac.cn/handle/331007/27392
专题中科院上海应用物理研究所2011-2018年
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Liu, JP,Li, X,Chen, S,et al. Nanofabrication and characterization of a grating-based condenser for uniform illumination with hard X-rays[J]. JOURNAL OF SYNCHROTRON RADIATION,2017,24:595-599.
APA Liu, JP.,Li, X.,Chen, S.,Zhang, SC.,Xie, SS.,...&Mao, CW.(2017).Nanofabrication and characterization of a grating-based condenser for uniform illumination with hard X-rays.JOURNAL OF SYNCHROTRON RADIATION,24,595-599.
MLA Liu, JP,et al."Nanofabrication and characterization of a grating-based condenser for uniform illumination with hard X-rays".JOURNAL OF SYNCHROTRON RADIATION 24(2017):595-599.
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