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Cleaning of carbon-contaminated optics using O-2/Ar plasma
Zhang, YF; Luo, HX; Guo, Z; Zhen, XJ; Chen, M; Liu, JN
2017
Source PublicationNUCLEAR SCIENCE AND TECHNIQUES
ISSN1001-8042
Volume28Issue:9Pages:-
Subtype期刊论文
AbstractCleaning of carbon-contaminated beamline optics was studied by RF plasma discharge process using O-2/Ar. Carbon-coated samples were prepared, and through their cleaning processes key parameters were determined, such as the optimal RF output power, mixing rates of O-2/Ar, and chamber vacuum. Considerations were made against possible adverse effects in cleaning the beamline optics, such as comparing the roughness of samples before and after cleaning, and possible detrimental kinetic effects on cable insulation. Under the cleaning parameters to clean the beamline optics, the thickness of removed carbon film and the change in beamline photon flux were analyzed.
KeywordIn-situ Removal Efficiency Recovery Vacuum-ultraviolet Resuscitation Gratings Diamond Mirrors Region Range Films
DOI10.1007/s41365-017-0274-z
WOS KeywordIN-SITU REMOVAL ; EFFICIENCY RECOVERY ; VACUUM-ULTRAVIOLET ; RESUSCITATION ; GRATINGS ; DIAMOND ; MIRRORS ; REGION ; RANGE ; FILMS
Indexed BySCI
Language英语
WOS IDWOS:000408853800008
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/28581
Collection中科院上海应用物理研究所2011-2018年
Recommended Citation
GB/T 7714
Zhang, YF,Luo, HX,Guo, Z,et al. Cleaning of carbon-contaminated optics using O-2/Ar plasma[J]. NUCLEAR SCIENCE AND TECHNIQUES,2017,28(9):-.
APA Zhang, YF,Luo, HX,Guo, Z,Zhen, XJ,Chen, M,&Liu, JN.(2017).Cleaning of carbon-contaminated optics using O-2/Ar plasma.NUCLEAR SCIENCE AND TECHNIQUES,28(9),-.
MLA Zhang, YF,et al."Cleaning of carbon-contaminated optics using O-2/Ar plasma".NUCLEAR SCIENCE AND TECHNIQUES 28.9(2017):-.
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