Cleaning of carbon-contaminated optics using O-2/Ar plasma
Zhang, YF; Luo, HX; Guo, Z; Zhen, XJ; Chen, M; Liu, JN
2017
发表期刊NUCLEAR SCIENCE AND TECHNIQUES
ISSN1001-8042
卷号28期号:9页码:-
文章类型期刊论文
摘要Cleaning of carbon-contaminated beamline optics was studied by RF plasma discharge process using O-2/Ar. Carbon-coated samples were prepared, and through their cleaning processes key parameters were determined, such as the optimal RF output power, mixing rates of O-2/Ar, and chamber vacuum. Considerations were made against possible adverse effects in cleaning the beamline optics, such as comparing the roughness of samples before and after cleaning, and possible detrimental kinetic effects on cable insulation. Under the cleaning parameters to clean the beamline optics, the thickness of removed carbon film and the change in beamline photon flux were analyzed.
关键词In-situ Removal Efficiency Recovery Vacuum-ultraviolet Resuscitation Gratings Diamond Mirrors Region Range Films
DOI10.1007/s41365-017-0274-z
关键词[WOS]IN-SITU REMOVAL ; EFFICIENCY RECOVERY ; VACUUM-ULTRAVIOLET ; RESUSCITATION ; GRATINGS ; DIAMOND ; MIRRORS ; REGION ; RANGE ; FILMS
收录类别SCI
语种英语
WOS记录号WOS:000408853800008
引用统计
文献类型期刊论文
条目标识符http://ir.sinap.ac.cn/handle/331007/28581
专题中科院上海应用物理研究所2011-2018年
推荐引用方式
GB/T 7714
Zhang, YF,Luo, HX,Guo, Z,et al. Cleaning of carbon-contaminated optics using O-2/Ar plasma[J]. NUCLEAR SCIENCE AND TECHNIQUES,2017,28(9):-.
APA Zhang, YF,Luo, HX,Guo, Z,Zhen, XJ,Chen, M,&Liu, JN.(2017).Cleaning of carbon-contaminated optics using O-2/Ar plasma.NUCLEAR SCIENCE AND TECHNIQUES,28(9),-.
MLA Zhang, YF,et al."Cleaning of carbon-contaminated optics using O-2/Ar plasma".NUCLEAR SCIENCE AND TECHNIQUES 28.9(2017):-.
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