Knowledge Management System Of Shanghai Institute of Applied Physics, CAS
| Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography | |
| Xue, CF; Zhao, J; Wu, YQ; Yu, HN; Yang, SM; Wang, LS; Zhao, WC; Wu, Q; Zhu, ZC; Liu, B; Zhang, X; Zhou, WC; Tai, RZ | |
| 2017 | |
| Source Publication | APPLIED SURFACE SCIENCE
 |
| ISSN | 0169-4332 |
| Volume | 425Issue:-Pages:553-557 |
| Subtype | 期刊论文 |
| Abstract | Periodic nanostructures have attracted considerable interest and been applied in many fields. However, nanostructures of sufficiently large areas and depths are necessary for the development of practical devices. In this study, large-area high-aspect-ratio periodic nanostructures were fabricated by using a hybrid technology based on X-ray interference lithography, and then the patterns were transferred onto various substrates successfully. The final periodic nanostructures on the substrate attained measurements up to square centimetres with depths greater than 200 nm. (C) 2017 Elsevier B.V. All rights reserved. |
| Keyword | Extreme-ultraviolet Nanoparticles Resolution Arrays Light |
| DOI | 10.1016/j.apsusc.2017.07.010 |
| Indexed By | SCI |
| WOS Keyword | EXTREME-ULTRAVIOLET ; NANOPARTICLES ; RESOLUTION ; ARRAYS ; LIGHT |
| Language | 英语 |
| WOS ID | WOS:000410609400068 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.sinap.ac.cn/handle/331007/28654 |
| Collection | 中科院上海应用物理研究所2011-2020年 |
| Recommended Citation GB/T 7714 | Xue, CF,Zhao, J,Wu, YQ,et al. Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography[J]. APPLIED SURFACE SCIENCE,2017,425(-):553-557. |
| APA | Xue, CF.,Zhao, J.,Wu, YQ.,Yu, HN.,Yang, SM.,...&Tai, RZ.(2017).Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography.APPLIED SURFACE SCIENCE,425(-),553-557. |
| MLA | Xue, CF,et al."Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography".APPLIED SURFACE SCIENCE 425.-(2017):553-557. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| Fabrication of large（1187KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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