CAS OpenIR  > 中科院上海应用物理研究所2011-2018年
Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography
Xue, CF; Zhao, J; Wu, YQ; Yu, HN; Yang, SM; Wang, LS; Zhao, WC; Wu, Q; Zhu, ZC; Liu, B; Zhang, X; Zhou, WC; Tai, RZ
2017
Source PublicationAPPLIED SURFACE SCIENCE
ISSN0169-4332
Volume425Issue:-Pages:553-557
Subtype期刊论文
AbstractPeriodic nanostructures have attracted considerable interest and been applied in many fields. However, nanostructures of sufficiently large areas and depths are necessary for the development of practical devices. In this study, large-area high-aspect-ratio periodic nanostructures were fabricated by using a hybrid technology based on X-ray interference lithography, and then the patterns were transferred onto various substrates successfully. The final periodic nanostructures on the substrate attained measurements up to square centimetres with depths greater than 200 nm. (C) 2017 Elsevier B.V. All rights reserved.
KeywordExtreme-ultraviolet Nanoparticles Resolution Arrays Light
DOI10.1016/j.apsusc.2017.07.010
WOS KeywordEXTREME-ULTRAVIOLET ; NANOPARTICLES ; RESOLUTION ; ARRAYS ; LIGHT
Indexed BySCI
Language英语
WOS IDWOS:000410609400068
Citation statistics
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/28654
Collection中科院上海应用物理研究所2011-2018年
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GB/T 7714
Xue, CF,Zhao, J,Wu, YQ,et al. Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography[J]. APPLIED SURFACE SCIENCE,2017,425(-):553-557.
APA Xue, CF.,Zhao, J.,Wu, YQ.,Yu, HN.,Yang, SM.,...&Tai, RZ.(2017).Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography.APPLIED SURFACE SCIENCE,425(-),553-557.
MLA Xue, CF,et al."Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography".APPLIED SURFACE SCIENCE 425.-(2017):553-557.
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