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| Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography | |
| Xue, CF; Zhao, J; Wu, YQ; Yu, HN; Yang, SM; Wang, LS; Zhao, WC; Wu, Q; Zhu, ZC; Liu, B; Zhang, X; Zhou, WC; Tai, RZ | |
| 2017 | |
| 发表期刊 | APPLIED SURFACE SCIENCE
 |
| ISSN | 0169-4332 |
| 卷号 | 425期号:-页码:553-557 |
| 文章类型 | 期刊论文 |
| 摘要 | Periodic nanostructures have attracted considerable interest and been applied in many fields. However, nanostructures of sufficiently large areas and depths are necessary for the development of practical devices. In this study, large-area high-aspect-ratio periodic nanostructures were fabricated by using a hybrid technology based on X-ray interference lithography, and then the patterns were transferred onto various substrates successfully. The final periodic nanostructures on the substrate attained measurements up to square centimetres with depths greater than 200 nm. (C) 2017 Elsevier B.V. All rights reserved. |
| 关键词 | Extreme-ultraviolet Nanoparticles Resolution Arrays Light |
| DOI | 10.1016/j.apsusc.2017.07.010 |
| 关键词[WOS] | EXTREME-ULTRAVIOLET ; NANOPARTICLES ; RESOLUTION ; ARRAYS ; LIGHT |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000410609400068 |
| 引用统计 | |
| 文献类型 | 期刊论文 |
| 条目标识符 | http://ir.sinap.ac.cn/handle/331007/28654 |
| 专题 | 中科院上海应用物理研究所2011-2018年 |
| 推荐引用方式 GB/T 7714 | Xue, CF,Zhao, J,Wu, YQ,et al. Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography[J]. APPLIED SURFACE SCIENCE,2017,425(-):553-557. |
| APA | Xue, CF.,Zhao, J.,Wu, YQ.,Yu, HN.,Yang, SM.,...&Tai, RZ.(2017).Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography.APPLIED SURFACE SCIENCE,425(-),553-557. |
| MLA | Xue, CF,et al."Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography".APPLIED SURFACE SCIENCE 425.-(2017):553-557. |
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