Direct Growth of Graphene on Silicon by Metal-Free Chemical Vapor Deposition

doi:10.1007/s40820-017-0173-1

CAS OpenIR > 中科院上海应用物理研究所2011-2018年

	Direct Growth of Graphene on Silicon by Metal-Free Chemical Vapor Deposition
	Tai, LX ; Zhu, DM ; Liu, X ; Yang, TY ; Wang, L ; Wang, R ; Jiang, S ; Chen, ZH ; Xu, ZM ; Li, XL
	2018
发表期刊	NANO-MICRO LETTERS
ISSN	2311-6706
卷号	10 期号:2 页码:-
文章类型	期刊论文
摘要	The metal-free synthesis of graphene on single-crystal silicon substrates, the most common commercial semiconductor, is of paramount significance for many technological applications. In this work, we report the growth of graphene directly on an upside-down placed, single-crystal silicon substrate using metal-free, ambient-pressure chemical vapor deposition. By controlling the growth temperature, in-plane propagation, edge-propagation, and core-propagation, the process of graphene growth on silicon can be identified. This process produces atomically flat monolayer or bilayer graphene domains, concave bilayer graphene domains, and bulging few-layer graphene domains. This work would be a significant step toward the synthesis of large-area and layer-controlled, high-quality graphene on single-crystal silicon substrates. [GRAPHICS]
关键词	Single-crystal Graphene Heterojunction Solar-cells Hexagonal Boron-nitride High-quality Layer Growth Cvd Growth Films Catalyst Copper Surface
DOI	10.1007/s40820-017-0173-1
收录类别	SCI
语种	英语
WOS记录号	WOS:000425093800003
引用统计
文献类型	期刊论文
条目标识符	http://ir.sinap.ac.cn/handle/331007/28972
专题	中科院上海应用物理研究所2011-2018年
作者单位	1.Tai, LX 2.Zhu, DM 3.Liu, X 4.Yang, TY 5.Wang, L 6.Wang, R 7.Jiang, S 8.Chen, ZH 9.Xu, ZM 10.Li, XL
推荐引用方式 GB/T 7714	Tai, LX,Zhu, DM,Liu, X,et al. Direct Growth of Graphene on Silicon by Metal-Free Chemical Vapor Deposition[J]. NANO-MICRO LETTERS,2018,10(2):-.
APA	Tai, LX.,Zhu, DM.,Liu, X.,Yang, TY.,Wang, L.,...&Li, XL.(2018).Direct Growth of Graphene on Silicon by Metal-Free Chemical Vapor Deposition.NANO-MICRO LETTERS,10(2),-.
MLA	Tai, LX,et al."Direct Growth of Graphene on Silicon by Metal-Free Chemical Vapor Deposition".NANO-MICRO LETTERS 10.2(2018):-.

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