Effects of Y on helium behavior in Y-doped TiH2 films prepared by magnetron sputtering
Han, ZB; Wang, CJ; Cheng, GJ; Zhang, HL; Su, RR; Duan, YM; Gao, J; Ni, XJ; Ye, BJ; Zhang, W; Shi, LQ
2018
发表期刊JOURNAL OF ALLOYS AND COMPOUNDS
ISSN0925-8388
卷号744页码:778-784
文章类型期刊论文
摘要TiH2 and yttrium-doped TiH2 alloy films with different helium concentrations prepared by magnetron sputtering were investigated using ion beam analysis (IBA), X-ray diffraction (XRD), thermal helium desorption spectrometry (THDS), positron annihilation spectroscopy (PAS) and nanoindentation techniques. It was found that through increasing the concentration of doped Y atoms, strong release peaks of helium will be found at about 820 K. The release at 820 K corresponds to the binding energy of the helium state on grain boundary indicating that the majority of the helium exists in the grain boundaries. In addition, the results of XRD and nanoindentation indicate that the doping of Y in the TiH2 films can improve the hardness and the elastic modulus of the films because of the fine-grain strengthening caused by the decreased size of TiH2 grains. (C) 2018 Elsevier B.V. All rights reserved.
关键词Molecular-dynamics Simulation Titanium Tritide Temperature Evolution Alloy He
DOI10.1016/j.jallcom.2018.02.022
收录类别SCI
语种英语
WOS记录号WOS:000427513400096
引用统计
文献类型期刊论文
条目标识符http://ir.sinap.ac.cn/handle/331007/28988
专题中科院上海应用物理研究所2011-2018年
作者单位1.Han, ZB
2.Wang, CJ
3.Cheng, GJ
4.Zhang, HL
5.Su, RR
6.Duan, YM
7.Gao, J
8.Ni, XJ
9.Ye, BJ
10.Zhang, W
11.Shi, LQ
推荐引用方式
GB/T 7714
Han, ZB,Wang, CJ,Cheng, GJ,et al. Effects of Y on helium behavior in Y-doped TiH2 films prepared by magnetron sputtering[J]. JOURNAL OF ALLOYS AND COMPOUNDS,2018,744:778-784.
APA Han, ZB.,Wang, CJ.,Cheng, GJ.,Zhang, HL.,Su, RR.,...&Shi, LQ.(2018).Effects of Y on helium behavior in Y-doped TiH2 films prepared by magnetron sputtering.JOURNAL OF ALLOYS AND COMPOUNDS,744,778-784.
MLA Han, ZB,et al."Effects of Y on helium behavior in Y-doped TiH2 films prepared by magnetron sputtering".JOURNAL OF ALLOYS AND COMPOUNDS 744(2018):778-784.
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