Knowledge Management System Of Shanghai Institute of Applied Physics, CAS
| Thickness-dependent structural characteristics for a sputtering-deposited chromium monolayer and Cr/C and Cr/Sc multilayers | |
| Jiang, H; Wang, H; Zhu, JT; Xue, CF; Zhang, JY; Tian, NX; Li, AG | |
| 2018 | |
| 发表期刊 | JOURNAL OF SYNCHROTRON RADIATION
 |
| ISSN | 1600-5775 |
| 卷号 | 25页码:785-792 |
| 文章类型 | 期刊论文 |
| 摘要 | The interior structure, morphology and ligand surrounding of a sputtering-deposited chromium monolayer and Cr/C and Cr/Sc multilayers are determined by various hard X-ray techniques in order to reveal the growth characteristics of Cr-based thin films. A Cr monolayer presents a three-stage growth mode with sudden changes occurring at a layer thickness of similar to 2 nm and beyond 6 nm. Cr-based multilayers are proven to have denser structures due to interfacial diffusion and layer growth mode. Cr/C and Cr/Sc multilayers have different interfacial widths resulting from asymmetry, degree of crystallinity and thermal stability. Cr/Sc multilayers present similar ligand surroundings to Cr foil, whereas Cr/C multilayers are similar to Cr monolayers. The aim of this study is to help understand the structural evolution regulation versus layer thickness and to improve the deposition technology of Cr-based thin films, in particular for obtaining stable Cr-based multilayers with ultra-short periods. |
| 关键词 | Nitride Thin-films X-ray Mirrors Surface-morphology Optical-surfaces Growth Roughness Layer Microstructure Reflectivity Spectroscopy |
| DOI | 10.1107/S1600577518005143 |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000431150000016 |
| 引用统计 | |
| 文献类型 | 期刊论文 |
| 条目标识符 | http://ir.sinap.ac.cn/handle/331007/29188 |
| 专题 | 中科院上海应用物理研究所2011-2018年 |
| 作者单位 | 1.Jiang, H 2.Wang, H 3.Zhu, JT 4.Xue, CF 5.Zhang, JY 6.Tian, NX 7.Li, AG |
| 推荐引用方式 GB/T 7714 | Jiang, H,Wang, H,Zhu, JT,et al. Thickness-dependent structural characteristics for a sputtering-deposited chromium monolayer and Cr/C and Cr/Sc multilayers[J]. JOURNAL OF SYNCHROTRON RADIATION,2018,25:785-792. |
| APA | Jiang, H.,Wang, H.,Zhu, JT.,Xue, CF.,Zhang, JY.,...&Li, AG.(2018).Thickness-dependent structural characteristics for a sputtering-deposited chromium monolayer and Cr/C and Cr/Sc multilayers.JOURNAL OF SYNCHROTRON RADIATION,25,785-792. |
| MLA | Jiang, H,et al."Thickness-dependent structural characteristics for a sputtering-deposited chromium monolayer and Cr/C and Cr/Sc multilayers".JOURNAL OF SYNCHROTRON RADIATION 25(2018):785-792. |
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| Thickness-dependent （1482KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | 浏览 下载 | |
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