CAS OpenIR  > 中科院上海应用物理研究所2004-2010年
Effects of N(2) addition on nanocrystalline diamond films by HFCVD in Ar/CH(4) gas mixture
Rakha, SA; Xintai, Z; Zhu, DZ; Guojun, Y; Guojun, Y (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China
2010
Source PublicationCURRENT APPLIED PHYSICS
ISSN1567-1739
Volume10Issue:1Pages:5
AbstractNanocrystalline diamond (NCD) films were grown on silicon substrates by hot filament chemical vapor deposition in Ar/N(2)/CH(4) gas mixtures. The effects of seeding process prior to deposition, the total gas pressure, and concentration of nitrogen on the grain size, morphology and bonding nature in HFCVD technique were investigated. The results indicated that a low total gas pressure is favorable for nanosized diamond crystallites. Films micrograph obtained from scanning electron microscopy showed diamond nanograins elongated with the addition of nitrogen in the plasma. Crystal structure investigations were carried out by X-ray diffraction measurements for deposited films. An increase in the size of crystallite is also observed from XRD measurements in NCD film when nitrogen was added in plasma. From Raman spectra, it was observed that the relative intensity of G peak increases indicating more graphite content after nitrogen added in the plasma. The effects of the nitrogen incorporation in nanocrystalline films in HFCVD are discussed. (C) 2009 Elsevier B.V. All rights reserved.
KeywordHot Filament Cvd Nanocrystalline Diamond Films Electron Microscopy
Subject AreaMaterials Science ; Physics
Indexed BySCI
Language英语
Funding Project应物所项目组
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/6903
Collection中科院上海应用物理研究所2004-2010年
Corresponding AuthorGuojun, Y (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China
Recommended Citation
GB/T 7714
Rakha, SA,Xintai, Z,Zhu, DZ,et al. Effects of N(2) addition on nanocrystalline diamond films by HFCVD in Ar/CH(4) gas mixture[J]. CURRENT APPLIED PHYSICS,2010,10(1):5.
APA Rakha, SA,Xintai, Z,Zhu, DZ,Guojun, Y,&Guojun, Y .(2010).Effects of N(2) addition on nanocrystalline diamond films by HFCVD in Ar/CH(4) gas mixture.CURRENT APPLIED PHYSICS,10(1),5.
MLA Rakha, SA,et al."Effects of N(2) addition on nanocrystalline diamond films by HFCVD in Ar/CH(4) gas mixture".CURRENT APPLIED PHYSICS 10.1(2010):5.
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