CAS OpenIR  > 中科院上海应用物理研究所2004-2010年
Diamond films with preferred <110> texture by hot filament CVD at low pressure
Yang, SM; He, ZT(贺周同); Li, QT; Zhu, DZ(朱德彰); Gong, JL(巩金龙); Gong, JL (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China
2008
Source PublicationDIAMOND AND RELATED MATERIALS
ISSN0925-9635
Volume17Issue:12Pages:2075
AbstractThe effects of gas presssure on the textured growth of daimond films were investigated in a hot filament chemical vapor deposition (HFCVD) system. Diamond thin film with the growth rate of 1.3 mu m/h and with high < 110 > texture was obtained at 5 Torr when lowering the gas pressure from 40 Torr to 1 Torr. The formation of high density nanocrystalline diamond nuclei elongated along the < 110 > direction in the nucleation stage and its consequent growth at lower pressure were considered to be responsible for the formation of < 110 > textured diamond thin film. (C) 2008 Elsevier B.V. All I ights reserved.
Subject AreaPhysics
Indexed BySCI
Language英语
Funding Project应物所项目组
WOS IDWOS:000261140000016
Citation statistics
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/7693
Collection中科院上海应用物理研究所2004-2010年
Corresponding AuthorGong, JL (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China
Recommended Citation
GB/T 7714
Yang, SM,He, ZT,Li, QT,et al. Diamond films with preferred <110> texture by hot filament CVD at low pressure[J]. DIAMOND AND RELATED MATERIALS,2008,17(12):2075.
APA Yang, SM,He, ZT,Li, QT,Zhu, DZ,Gong, JL,&Gong, JL .(2008).Diamond films with preferred <110> texture by hot filament CVD at low pressure.DIAMOND AND RELATED MATERIALS,17(12),2075.
MLA Yang, SM,et al."Diamond films with preferred <110> texture by hot filament CVD at low pressure".DIAMOND AND RELATED MATERIALS 17.12(2008):2075.
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