CAS OpenIR  > 中科院上海应用物理研究所2004-2010年
Shanghai electron beam ion trap: Design and current status
Zhu, XK; Shugang, S; Yan, HP(阎和平); Gong, PR(龚培龙); Wang, N(王纳秀); Shi, WG; Chen, YL; Xu, XY; Feng, SQ; Zhou, TT
2004
Conference Name9th International Symposium on Electron Beam Ion Sources and Traps and Their Applications
Source PublicationNinth International Symposium on Electron Beam Ion Sources and Traps and Their Applications
Pages65
Conference DateAPR 15-17, 2004
Conference PlaceTokyo, JAPAN
AbstractA new electron beam ion trap (EBIT) is under constructing in Shanghai. In this paper we describe the design and the features of this apparatus. Finally the current status of Shanghai-EBIT is shown.
ISSN1742-6588
Indexed BySCI
Funding Project应物所课题组
Language英语
Document Type会议论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/8892
Collection中科院上海应用物理研究所2004-2010年
Recommended Citation
GB/T 7714
Zhu, XK,Shugang, S,Yan, HP,et al. Shanghai electron beam ion trap: Design and current status[C],2004:65.
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