Knowledge Management System Of Shanghai Institute of Applied Physics, CAS
Shanghai electron beam ion trap: Design and current status | |
Zhu, XK; Shugang, S; Yan, HP(阎和平); Gong, PR(龚培龙); Wang, N(王纳秀); Shi, WG; Chen, YL; Xu, XY; Feng, SQ; Zhou, TT | |
2004 | |
Conference Name | 9th International Symposium on Electron Beam Ion Sources and Traps and Their Applications |
Source Publication | Ninth International Symposium on Electron Beam Ion Sources and Traps and Their Applications |
Pages | 65 |
Conference Date | APR 15-17, 2004 |
Conference Place | Tokyo, JAPAN |
Abstract | A new electron beam ion trap (EBIT) is under constructing in Shanghai. In this paper we describe the design and the features of this apparatus. Finally the current status of Shanghai-EBIT is shown. |
ISSN | 1742-6588 |
Indexed By | SCI |
Funding Project | 应物所课题组 |
Language | 英语 |
Document Type | 会议论文 |
Identifier | http://ir.sinap.ac.cn/handle/331007/8892 |
Collection | 中科院上海应用物理研究所2004-2010年 |
Recommended Citation GB/T 7714 | Zhu, XK,Shugang, S,Yan, HP,et al. Shanghai electron beam ion trap: Design and current status[C],2004:65. |
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