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| A synchrotron-based photoemission study of the MoO3/Co interface | |
| Wang, Yu-Zhan; Yang, Ming; Qi, Dong-Chen; Chen, Shi; Chen, Wei; Wee, Andrew T. S.; Gao, Xing-Yu（高兴宇） | |
| 2011 | |
| Source Publication | JOURNAL OF CHEMICAL PHYSICS
 |
| ISSN | 0021-9606 |
| Volume | 134Issue:3 |
| Abstract | The electronic structures at the MoO3/Co interface were investigated using synchrotron-based ultraviolet and x-ray photoelectron spectroscopy. It was found that interfacial chemical reactions lead to the reduction of Mo oxidation states and the formation of Co-O bonds. These interfacial chemical reactions also induce a large interface dipole, which significantly increases the work function of the cobalt substrate. In addition, two interface states located at 1.0 and 2.0 eV below the Fermi level are identified. These two states overlap at film thickness of between 2-4 nm, which suggests the MoO3 intermediate layer may facilitate ohmic charge transport. (C) 2011 American Institute of Physics. [doi:10.1063/1.3546034] |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | 应物所项目组 |
| WOS ID | WOS:000286472200063 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.sinap.ac.cn/handle/331007/9453 |
| Collection | 中科院上海应用物理研究所2011-2019年 |
| Recommended Citation GB/T 7714 | Wang, Yu-Zhan,Yang, Ming,Qi, Dong-Chen,et al. A synchrotron-based photoemission study of the MoO3/Co interface[J]. JOURNAL OF CHEMICAL PHYSICS,2011,134(3). |
| APA | Wang, Yu-Zhan.,Yang, Ming.,Qi, Dong-Chen.,Chen, Shi.,Chen, Wei.,...&Gao, Xing-Yu.(2011).A synchrotron-based photoemission study of the MoO3/Co interface.JOURNAL OF CHEMICAL PHYSICS,134(3). |
| MLA | Wang, Yu-Zhan,et al."A synchrotron-based photoemission study of the MoO3/Co interface".JOURNAL OF CHEMICAL PHYSICS 134.3(2011). |
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