CAS OpenIR  > 中科院上海应用物理研究所2011-2019年
A synchrotron-based photoemission study of the MoO3/Co interface
Wang, Yu-Zhan; Yang, Ming; Qi, Dong-Chen; Chen, Shi; Chen, Wei; Wee, Andrew T. S.; Gao, Xing-Yu(高兴宇)
2011
Source PublicationJOURNAL OF CHEMICAL PHYSICS
ISSN0021-9606
Volume134Issue:3
AbstractThe electronic structures at the MoO3/Co interface were investigated using synchrotron-based ultraviolet and x-ray photoelectron spectroscopy. It was found that interfacial chemical reactions lead to the reduction of Mo oxidation states and the formation of Co-O bonds. These interfacial chemical reactions also induce a large interface dipole, which significantly increases the work function of the cobalt substrate. In addition, two interface states located at 1.0 and 2.0 eV below the Fermi level are identified. These two states overlap at film thickness of between 2-4 nm, which suggests the MoO3 intermediate layer may facilitate ohmic charge transport. (C) 2011 American Institute of Physics. [doi:10.1063/1.3546034]
Indexed BySCI
Language英语
Funding Project应物所项目组
WOS IDWOS:000286472200063
Citation statistics
Cited Times:11[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/9453
Collection中科院上海应用物理研究所2011-2019年
Recommended Citation
GB/T 7714
Wang, Yu-Zhan,Yang, Ming,Qi, Dong-Chen,et al. A synchrotron-based photoemission study of the MoO3/Co interface[J]. JOURNAL OF CHEMICAL PHYSICS,2011,134(3).
APA Wang, Yu-Zhan.,Yang, Ming.,Qi, Dong-Chen.,Chen, Shi.,Chen, Wei.,...&Gao, Xing-Yu.(2011).A synchrotron-based photoemission study of the MoO3/Co interface.JOURNAL OF CHEMICAL PHYSICS,134(3).
MLA Wang, Yu-Zhan,et al."A synchrotron-based photoemission study of the MoO3/Co interface".JOURNAL OF CHEMICAL PHYSICS 134.3(2011).
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