Knowledge Management System Of Shanghai Institute of Applied Physics, CAS
DIODE CHARACTERISTICS AND DEGRADATION MECHANISM OF ION-IMPLANTED POLYACETYLENE FILMS | |
WANG, WM; WAN, HH; RONG, TW; BAO, JR; LIN, SH | |
1991 | |
Source Publication | NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
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ISSN | 0168-583X |
Volume | 61Issue:4Pages:466 |
Abstract | The diode characteristics (rectifying ratio, threshold and breakdown voltage) have been studied for a p-n junction produced by implanting K+ ions into FeCl3 doped polyacetylene (PA) films which were synthesized by the rare-earth catalyst technique and Naarmann method, respectively. A rectifying ratio of over 300 and a breakdown voltage of about 25-30 V have been achieved. Some of the modified PA films could keep their p-n junctions for more than 2000 hours at the temperature of 0-degrees-C after implantation. Different ion beam techniques were used to investigate the PA film oxidation, dopant losses and the diffusion of implanted species for the purpose of trying to have a good understanding of the degration mechanism for a polymer p-n junction. |
Indexed By | SCI |
Language | 英语 |
Funding Project | 应物所项目组 |
Document Type | 期刊论文 |
Identifier | http://ir.sinap.ac.cn/handle/331007/9933 |
Collection | 中科院上海原子核所2003年前 |
Recommended Citation GB/T 7714 | WANG, WM,WAN, HH,RONG, TW,et al. DIODE CHARACTERISTICS AND DEGRADATION MECHANISM OF ION-IMPLANTED POLYACETYLENE FILMS[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,1991,61(4):466. |
APA | WANG, WM,WAN, HH,RONG, TW,BAO, JR,&LIN, SH.(1991).DIODE CHARACTERISTICS AND DEGRADATION MECHANISM OF ION-IMPLANTED POLYACETYLENE FILMS.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,61(4),466. |
MLA | WANG, WM,et al."DIODE CHARACTERISTICS AND DEGRADATION MECHANISM OF ION-IMPLANTED POLYACETYLENE FILMS".NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 61.4(1991):466. |
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