CAS OpenIR  > 中科院上海原子核所2003年前
FLUENCE DEPENDENCE OF MEAN SPUTTER DEPTH FOR BOMBARDED PT-CU AND B-10-B-11 BINARY MATERIALS
ZHENG, LP(郑里平); LI, RS
1995
Source PublicationJOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
ISSN1005-0302
Volume11Issue:5Pages:349
AbstractThe mean sputter depth depends on the surface composition gradient during ion implantation. For the high fluence ion implantation into a Pt-Cu alloy, the surface composition gradient of Cu is so large that the difference in mean sputter depth between Pt and Cu, is significant. However, for the high fluence ion implantation into B-10-B-11 isotope mixture, the surface composition gradient of B-10 is so small that the difference in mean sputter depth between B-10 and B-11 is insignificant.
Indexed BySCI
Funding Project应物所项目组
Document Type期刊论文
Identifierhttp://ir.sinap.ac.cn/handle/331007/9977
Collection中科院上海原子核所2003年前
Recommended Citation
GB/T 7714
ZHENG, LP,LI, RS. FLUENCE DEPENDENCE OF MEAN SPUTTER DEPTH FOR BOMBARDED PT-CU AND B-10-B-11 BINARY MATERIALS[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,1995,11(5):349.
APA ZHENG, LP,&LI, RS.(1995).FLUENCE DEPENDENCE OF MEAN SPUTTER DEPTH FOR BOMBARDED PT-CU AND B-10-B-11 BINARY MATERIALS.JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,11(5),349.
MLA ZHENG, LP,et al."FLUENCE DEPENDENCE OF MEAN SPUTTER DEPTH FOR BOMBARDED PT-CU AND B-10-B-11 BINARY MATERIALS".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 11.5(1995):349.
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