CAS OpenIR

Browse/Search Results:  1-10 of 60 Help

Selected(0)Clear Items/Page:    Sort:
Temperature dependence of spherical micelles of PS3000-b-PAA(5000) studied by in-situ small angle X-ray scattering 期刊论文
ACTA PHYSICA SINICA, 2018, 卷号: 67, 期号: 4, 页码: -
Authors:  Jin, X;  Yang, CM;  Hua, WQ;  Li, YW;  Wang, J
View  |  Adobe PDF(1259Kb)  |  Favorite  |  View/Download:90/45  |  Submit date:2018/09/06
Amphiphilic Block-copolymer  Acid) Diblock Copolymers  Drug-delivery  Filtration Membranes  Water  Morphologies  Lithography  Solvents  System  Ph  
Directional emission of plastic luminescent films using photonic crystals fabricated by soft-X-ray interference lithography and reactive ion etching 期刊论文
SCIENTIFIC REPORTS, 2018, 卷号: 8, 页码: -
Authors:  Wu, Q;  Liu, B;  Zhu, ZC;  Gu, M;  Chen, H;  Xue, CF;  Zhao, J;  Wu, YQ;  Tai, RZ;  Ouyang, XP
View  |  Adobe PDF(4184Kb)  |  Favorite  |  View/Download:41/5  |  Submit date:2018/09/06
Light-emitting-diodes  Extraction Efficiency  Wave-guide  Nanocrystals  Fluorescence  Scintillator  Enhancement  Substrate  Surface  Arrays  
One-Dimensional Zinc Oxide Nanomaterials for Application in High-Performance Advanced Optoelectronic Devices 期刊论文
CRYSTALS, 2018, 卷号: 8, 期号: 5, 页码: -
Authors:  Ding, M;  Guo, Z;  Zhou, LQ;  Fang, X;  Zhang, LL;  Zeng, LY;  Xie, LN;  Zhao, HB
View  |  Adobe PDF(88206Kb)  |  Favorite  |  View/Download:36/7  |  Submit date:2018/09/06
Zno Nanowire Arrays  Light-emitting Diode  Nanorods/meh-ppv Heterostructure  Flame Transport Approach  Electrochemical Deposition  Field-emission  Ultraviolet Electroluminescence  Ag Nanoparticles  Enhanced Photoresponse  Hydrothermal Growth  
Formation of surface nanobubbles on nanostructured substrates 期刊论文
NANOSCALE, 2017, 卷号: 9, 期号: 3, 页码: 1078-1086
Authors:  Wang, L;  Wang, XY;  Wang, LS;  Hu, J;  Wang, CL;  Zhao, BY;  Zhang, XH;  Tai, RZ;  He, MD;  Chen, LQ;  Zhang, LJ
View  |  Adobe PDF(320Kb)  |  Favorite  |  View/Download:33/15  |  Submit date:2017/12/08
Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography 期刊论文
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2017, 卷号: 35, 期号: 2, 页码: -
Authors:  Yang, SM;  Zhao, J;  Wang, LS;  Zhu, FY;  Xue, CF;  Liu, HG;  Sang, HZ;  Wu, YQ;  Tai, RZ
View  |  Adobe PDF(3137Kb)  |  Favorite  |  View/Download:52/17  |  Submit date:2017/12/08
Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography 期刊论文
MICROELECTRONIC ENGINEERING, 2017, 卷号: 170, 页码: 49-53
Authors:  Zhao, J;  Wu, YQ;  Xue, CF;  Yang, SM;  Wang, LS;  Zhu, FY;  Zhu, ZC;  Liu, B;  Wang, Y;  Tai, RZ
View  |  Adobe PDF(783Kb)  |  Favorite  |  View/Download:49/22  |  Submit date:2017/12/08
Periodic Structures  Scintillator  Soft X-ray Interference Lithography  High Aspect Ratio  
Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography 期刊论文
APPLIED SURFACE SCIENCE, 2017, 卷号: 425, 期号: -, 页码: 553-557
Authors:  Xue, CF;  Zhao, J;  Wu, YQ;  Yu, HN;  Yang, SM;  Wang, LS;  Zhao, WC;  Wu, Q;  Zhu, ZC;  Liu, B;  Zhang, X;  Zhou, WC;  Tai, RZ
View  |  Adobe PDF(1187Kb)  |  Favorite  |  View/Download:21/8  |  Submit date:2018/08/30
Extreme-ultraviolet  Nanoparticles  Resolution  Arrays  Light  
Development of broadband X-ray interference lithography large area exposure system 期刊论文
REVIEW OF SCIENTIFIC INSTRUMENTS, 2016, 卷号: 87, 期号: 4, 页码: —
Authors:  Xue, CF;  Wu, YQ;  Zhu, FY;  Yang, SM;  Liu, HG;  Zhao, J;  Wang, LS;  Tai, RZ;  Tai, RZ (reprint author), Chinese Acad Sci, Shanghai Synchrotron Radiat Facil, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China.
View  |  Adobe PDF(3963Kb)  |  Favorite  |  View/Download:74/20  |  Submit date:2016/09/12
Interferometric Lithography  High-resolution  Fabrication  Arrays  Grids  Light  
Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility 期刊论文
MICROELECTRONIC ENGINEERING, 2016, 卷号: 155, 页码: 55-60
Authors:  Fan, D;  Buitrago, E;  Yang, SM;  Karim, W;  Wu, YQ;  Tai, RZ;  Ekinci, Y;  Buitrago, E (reprint author), Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland.;  Yang, SM (reprint author), Shanghai Inst Appl Phys, Shanghai Synchrotron Radiat Facil, 239 Zhangheng Rd, Shanghai, Peoples R China.
View  |  Adobe PDF(1812Kb)  |  Favorite  |  View/Download:67/16  |  Submit date:2017/03/02
Euv  Interference Lithography  High Resolution  Nano-lithography  Achromatic Talbot Lithography  
High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography 期刊论文
OPTICS EXPRESS, 2016, 卷号: 24, 期号: 17, 页码: 19112-19121
Authors:  Sun, LB;  Hu, XL;  Wu, QJ;  Wang, LS;  Zhao, J;  Yang, SM;  Tai, RZ;  Fecht, HJ;  Zhang, DX;  Wang, LQ;  Jiang, JZ;  Wang, LQ (reprint author), Zhejiang Univ, State Key Lab Modern Opt Instrumentat, Hangzhou 310027, Zhejiang, Peoples R China.;  Jiang, JZ (reprint author), Zhejiang Univ, Int Ctr New Struct Mat, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China.;  Jiang, JZ (reprint author), Zhejiang Univ, Sch Mat Sci & Engn, Hangzhou 310027, Zhejiang, Peoples R China.
View  |  Adobe PDF(4208Kb)  |  Favorite  |  View/Download:79/23  |  Submit date:2017/03/02