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软X射线光子关联谱装置设计 期刊论文
核技术, 2019, 卷号: 42, 期号: 04, 页码: 15-22
Authors:  屈斯诗;  郭智;  邰仁忠;  张祥志;  刘海岗;  于怀娜
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软X射线  光子关联谱  强度关联  动力学  
Phase-retrieval-based synchrotron X-ray micro-tomography for 3D structural characterization and quantitative analysis of agalloch eaglewood 期刊论文
WOOD SCIENCE AND TECHNOLOGY, 2018, 卷号: 52, 期号: 3, 页码: 839-854
Authors:  Liu, HQ;  Lin, FH;  Lin, JH;  Sulaiman, K;  Xiao, TQ;  Sun, Y;  Pang, Y;  Liu, HG
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Contrast Tomography  Fresnel Region  Microtomography  
一种高分辨率成像系统 专利
专利类型: 发明专利, 专利号: CN106982315A, 申请日期: 2017-07-25, 公开日期: 2017-07-25
Authors:  刘海岗;  许子健;  王春鹏;  陶旭磊;  邰仁忠
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Effects of temperature, mechanical motion and source positional jitter on the resolving power of beamline 02B at the SSRF 期刊论文
JOURNAL OF SYNCHROTRON RADIATION, 2017, 卷号: 24, 期号: -, 页码: 877-885
Authors:  Guo, Z;  Meng, XY;  Wang, Y;  Liu, HG;  Zhang, XZ;  Li, ZL;  Xue, L;  Tai, RZ
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Radiation  Vibration  Stability  Monitor  
Robust phase-retrieval-based X-ray tomography for morphological assessment of early hepatic echinococcosis infection in rats 期刊论文
PLOS ONE, 2017, 卷号: 12, 期号: 9, 页码: -
Authors:  Liu, HQ;  Zhang, CS;  Fan, XX;  Duan, YN;  Xiao, TQ;  Du, GH;  Fu, YN;  Liu, HG;  Wen, H
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Alveolar Echinococcosis  Contrast Tomography  Attenuation Duality  Fresnel Region  Microtomography  Holotomography  Optimization  Ultrasound  Liver  Image  
Influence of symmetry and duty cycles on the pattern generation in achromatic Talbot lithography 期刊论文
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2017, 卷号: 35, 期号: 2, 页码: -
Authors:  Yang, SM;  Zhao, J;  Wang, LS;  Zhu, FY;  Xue, CF;  Liu, HG;  Sang, HZ;  Wu, YQ;  Tai, RZ
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Background noise removal in x-ray ptychography 期刊论文
APPLIED OPTICS, 2017, 卷号: 56, 期号: 8, 页码: 2099-2111
Authors:  Wang, CP;  Xu, ZJ;  Liu, HG;  Wang, Y;  Wang, J;  Tai, RZ
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Development of broadband X-ray interference lithography large area exposure system 期刊论文
REVIEW OF SCIENTIFIC INSTRUMENTS, 2016, 卷号: 87, 期号: 4, 页码: —
Authors:  Xue, CF;  Wu, YQ;  Zhu, FY;  Yang, SM;  Liu, HG;  Zhao, J;  Wang, LS;  Tai, RZ;  Tai, RZ (reprint author), Chinese Acad Sci, Shanghai Synchrotron Radiat Facil, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China.
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Interferometric Lithography  High-resolution  Fabrication  Arrays  Grids  Light  
一种同步辐射X射线大面积干涉光刻系统 专利
专利类型: 发明专利, 专利号: CN105182701A, 申请日期: 2015-12-23, 公开日期: 2015-12-23
Authors:  薛超凡;  吴衍青;  刘海岗;  杨树敏;  王连升;  赵俊;  邰仁忠
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Outgassing analysis of molecular glass photoresists under EUV irradiation 期刊论文
SCIENCE CHINA-CHEMISTRY, 2014, 卷号: 57, 期号: 12, 页码: 1746—1750
Authors:  Chen, L;  Xu, J;  Yuan, H;  Yang, SM;  Wang, LS;  Wu, YQ;  Zhao, J;  Chen, M;  Liu, HG;  Li, SY;  Tai, RZ;  Wang, SQ;  Yang, GQ;  g1704@iccas.ac.cn;  gqyang@iccas.ac.cn
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Lithography