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熔盐基碳纳米流体及其制备方法 专利
专利类型: 发明专利, 专利号: CN106957636A, 申请日期: 2020-10-23, 公开日期: 2017-07-18
Authors:  汪洋;  赵素芳;  程进辉;  谢雷东;  李明广;  张鹏;  唐忠锋;  左勇;  王坤;  费泽杰
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Effect of CrF3 on the corrosion behaviour of Hastelloy-N and 316L stainless steel alloys in FLiNaK molten salt 期刊论文
CORROSION SCIENCE, 2018, 卷号: 131, 页码: 355-364
Authors:  Yin, HQ;  Qiu, J;  Liu, HJ;  Liu, WG;  Wang, Y;  Fei, ZJ;  Zhao, SF;  An, XH;  Cheng, JH;  Chen, T;  Zhang, P;  Yu, GJ;  Xie, LD
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Naf-kf Salt  Nuclear-power  Fe-cr  Fluoride  Reactors  Flow  
一种含铬的缓蚀熔盐及其制备工艺 专利
专利类型: 发明专利, 专利号: CN106590547A, 申请日期: 2017-04-26, 公开日期: 2017-04-26
Authors:  赵素芳;  汪洋;  孙华;  张鹏;  谢雷东;  姚思德
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The effect of corrosion product CrF3 on thermo-physical properties of FLiNaK 期刊论文
JOURNAL OF NUCLEAR SCIENCE AND TECHNOLOGY, 2016, 卷号: 53, 期号: 1, 页码: 61—68
Authors:  Yin, HQ;  Zhang, P;  An, XH;  Zhao, SF;  Xie, LD;  Wang, WF;  Xie, LD (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, Dept Molten Salt Chem & Engn Technol, Shanghai 201800, Peoples R China.
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一种氟盐中氧含量的测试方法 专利
专利类型: 发明, 专利号: CN104089917, 申请日期: 2014-05-04,
Authors:  赵素芳;  李明广;  谢雷东;  汪洋;  苏兴治
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陶瓷材料在LiF-NaF-KF熔盐中的腐蚀行为研究 期刊论文
化工新型材料, 2014, 期号: 3, 页码: 111-113+117
Authors:  汪洋;  黄师荣;  唐忠锋;  谢雷东;  阴慧琴;  赵素芳
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氟化物熔盐  陶瓷材料  腐蚀行为  微观形貌  
Study on the role of hydroperoxyl radical in degradation of p-nitrophenol attacked by hydroxyl radical using photolytical technique 期刊论文
JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY, 2013, 卷号: 259, 页码: CONCATENATE(Sheet1!I334,-Sheet1!J334)
Authors:  Zhao, Sufang;  Ma, Hongjuan;  Wang, Min;  Cao, Changqing;  Yao, Side
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活性氧与羟基自由基协同降解对硝基苯酚的机理研究 学位论文
, 北京: 中国科学院研究生院, 2010
Authors:  赵素芳
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254/185 nm photolysis of p-nitrophenol 期刊论文
NUCLEAR SCIENCE AND TECHNIQUES, 2010, 卷号: 21, 期号: 3, 页码: 5
Authors:  Zhao, SF;  Ma, HJ;  Wang, M;  Cao, CQ;  Xiong, J;  Xu, YS;  Yao, SD;  Yao, SD (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China
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Vuv  P-nitrophenol  Degradation  Advanced Oxidation Process  
Study on the mechanism of photo-degradation of p-nitrophenol exposed to 254 nm UV light 期刊论文
JOURNAL OF HAZARDOUS MATERIALS, 2010, 卷号: 180, 期号: 40546, 页码: 5
Authors:  Zhao, SF;  Ma, HJ;  Wang, M;  Cao, CQ;  Xiong, J;  Xu, YS;  Yao, SD;  Yao, SD (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, POB 800-204,2019 Baojia Rd, Shanghai 201800, Peoples R China
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P-nitrophenol  Laser Flash Photolysis  Photo-degradation  Phenoxyl Radical