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Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility 期刊论文
MICROELECTRONIC ENGINEERING, 2016, 卷号: 155, 页码: 55-60
Authors:  Fan, D;  Buitrago, E;  Yang, SM;  Karim, W;  Wu, YQ;  Tai, RZ;  Ekinci, Y;  Buitrago, E (reprint author), Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland.;  Yang, SM (reprint author), Shanghai Inst Appl Phys, Shanghai Synchrotron Radiat Facil, 239 Zhangheng Rd, Shanghai, Peoples R China.
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Euv  Interference Lithography  High Resolution  Nano-lithography  Achromatic Talbot Lithography