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Nonuniform self-imaging of achromatic Talbot lithography 期刊论文
CHINESE OPTICS LETTERS, 2019, 卷号: 17, 期号: 6, 页码: -
Authors:  Xia, HJ;  Yang, SM;  Wang, LS;  Zhao, J;  Xue, CF;  Wu, YQ;  Tai, RZ
View  |  Adobe PDF(794Kb)  |  Favorite  |  View/Download:20/5  |  Submit date:2020/10/16
INTERFEROMETRIC LITHOGRAPHY  INTERFERENCE  
Parallel direct writing achromatic talbot lithography: a method for large-area arbitrary sub-micron periodic nano-arrays fabrication 期刊论文
NANOTECHNOLOGY, 2019, 卷号: 30, 期号: 31, 页码: —
Authors:  Yang, SM;  Xue, CF;  Zhao, J;  Wang, LS;  Wu, YQ;  Tai, RZ
View  |  Adobe PDF(1588Kb)  |  Favorite  |  View/Download:58/3  |  Submit date:2019/12/30
BEAM INTERFERENCE LITHOGRAPHY  RESOLUTION  METAMATERIALS  METASURFACE  RESONANCES  SPLITTER  LIGHT  ANGLE  
Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography 期刊论文
MICROELECTRONIC ENGINEERING, 2017, 卷号: 170, 页码: 49-53
Authors:  Zhao, J;  Wu, YQ;  Xue, CF;  Yang, SM;  Wang, LS;  Zhu, FY;  Zhu, ZC;  Liu, B;  Wang, Y;  Tai, RZ
View  |  Adobe PDF(783Kb)  |  Favorite  |  View/Download:145/48  |  Submit date:2017/12/08
Periodic Structures  Scintillator  Soft X-ray Interference Lithography  High Aspect Ratio  
Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility 期刊论文
MICROELECTRONIC ENGINEERING, 2016, 卷号: 155, 页码: 55-60
Authors:  Fan, D;  Buitrago, E;  Yang, SM;  Karim, W;  Wu, YQ;  Tai, RZ;  Ekinci, Y;  Buitrago, E (reprint author), Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland.;  Yang, SM (reprint author), Shanghai Inst Appl Phys, Shanghai Synchrotron Radiat Facil, 239 Zhangheng Rd, Shanghai, Peoples R China.
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Euv  Interference Lithography  High Resolution  Nano-lithography  Achromatic Talbot Lithography