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Latent Tracks in Ion-Irradiated LiTaO3 Crystals: Damage Morphology Characterization and Thermal Spike Analysis 期刊论文
CRYSTALS, 2020, 卷号: 10, 期号: 10, 页码: -
Authors:  Han, XQ;  Liu, Y;  Crespillo, ML;  Zarkadoula, E;  Huang, Q;  Wang, XL;  Liu, P
View  |  Adobe PDF(3347Kb)  |  Favorite  |  View/Download:2/0  |  Submit date:2021/09/06
ELECTRONIC-ENERGY LOSS  HEAVY-ION  AMORPHIZATION  ACCUMULATION  IMPLANTATION  LITHOGRAPHY  
Nonuniform self-imaging of achromatic Talbot lithography 期刊论文
CHINESE OPTICS LETTERS, 2019, 卷号: 17, 期号: 6, 页码: -
Authors:  Xia, HJ;  Yang, SM;  Wang, LS;  Zhao, J;  Xue, CF;  Wu, YQ;  Tai, RZ
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INTERFEROMETRIC LITHOGRAPHY  INTERFERENCE  
Parallel direct writing achromatic talbot lithography: a method for large-area arbitrary sub-micron periodic nano-arrays fabrication 期刊论文
NANOTECHNOLOGY, 2019, 卷号: 30, 期号: 31, 页码: —
Authors:  Yang, SM;  Xue, CF;  Zhao, J;  Wang, LS;  Wu, YQ;  Tai, RZ
Adobe PDF(1588Kb)  |  Favorite  |  View/Download:51/2  |  Submit date:2019/12/30
BEAM INTERFERENCE LITHOGRAPHY  RESOLUTION  METAMATERIALS  METASURFACE  RESONANCES  SPLITTER  LIGHT  ANGLE  
One-step ion beam irradiation manufacture of 3D micro/nanopatterned structures in SiC with tunable work functions 期刊论文
CARBON, 2019, 卷号: 148, 期号: -, 页码: 387—393
Authors:  Zhou, YY;  Li, SM;  Wang, Y;  Huang, Q;  Zhang, W;  Yao, Y;  Hao, JM;  Sun, Y;  Tang, M;  Li, B;  Zhang, Y;  Hu, J;  Yan, L
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FIELD-EMISSION  LITHOGRAPHY  FABRICATION  TEMPLATE  GRAPHENE  DEFECTS  TIP  
The wave optical whole process design of the soft X-ray interference lithography beamline at SSRF 期刊论文
JOURNAL OF SYNCHROTRON RADIATION, 2018, 卷号: 25, 期号: -, 页码: 1869-1876
Authors:  Xue, CF;  Meng, XY;  Wu, YQ;  Wang, Y;  Wang, LS;  Yang, SM;  Zhao, J;  Tai, RZ
Adobe PDF(1525Kb)  |  Favorite  |  View/Download:36/7  |  Submit date:2019/12/17
INTERFEROMETRIC LITHOGRAPHY  FABRICATION  PERFORMANCE  BAND  
Mechanical-force-promoted peptide assembly: a general method 期刊论文
NUCLEAR SCIENCE AND TECHNIQUES, 2018, 卷号: 29, 期号: 9, 页码: -
Authors:  Yuan, Y;  Du, QQG;  Wang, YJ;  Hu, J;  Lou, ST;  Zhang, Y
Adobe PDF(1288Kb)  |  Favorite  |  View/Download:33/3  |  Submit date:2019/12/17
SCANNING PROBE LITHOGRAPHY  SUPPORTED LIPID-BILAYERS  MICROSCOPY  INTERFACES  ACTIN  MICA  MANIPULATION  FABRICATION  PROTEINS  SURFACES  
Temperature dependence of spherical micelles of PS3000-b-PAA(5000) studied by in-situ small angle X-ray scattering 期刊论文
ACTA PHYSICA SINICA, 2018, 卷号: 67, 期号: 4, 页码: -
Authors:  Jin, X;  Yang, CM;  Hua, WQ;  Li, YW;  Wang, J
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Amphiphilic Block-copolymer  Acid) Diblock Copolymers  Drug-delivery  Filtration Membranes  Water  Morphologies  Lithography  Solvents  System  Ph  
Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography 期刊论文
MICROELECTRONIC ENGINEERING, 2017, 卷号: 170, 页码: 49-53
Authors:  Zhao, J;  Wu, YQ;  Xue, CF;  Yang, SM;  Wang, LS;  Zhu, FY;  Zhu, ZC;  Liu, B;  Wang, Y;  Tai, RZ
Adobe PDF(783Kb)  |  Favorite  |  View/Download:140/47  |  Submit date:2017/12/08
Periodic Structures  Scintillator  Soft X-ray Interference Lithography  High Aspect Ratio  
Transfer of Two-Dimensional Oligonucleotide Patterns onto Stereocontrolled Plasmonic Nanostructures through DNA-Origami-Based Nanoimprinting Lithography 期刊论文
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, 2016, 卷号: 55, 期号: 28, 页码: 8036-8040
Authors:  Zhang, YN;  Chao, J;  Liu, HJ;  Wang, F;  Su, S;  Liu, B;  Zhang, L;  Shi, JY;  Wang, LH;  Huang, W;  Wang, LH;  Fan, CH;  Wang, LH (reprint author), Nanjing Univ, Posts & Telecommun Inst, KLOEID, Inst Adv Mat, 9 Wenyuan Rd, Nanjing 210046, Jiangsu, Peoples R China.;  Wang, LH (reprint author), Nanjing Univ, Posts & Telecommun Inst, Sch Mat Sci & Engn, 9 Wenyuan Rd, Nanjing 210046, Jiangsu, Peoples R China.;  Fan, CH (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, CAS Key Lab Interfacial Phys & Technol, Shanghai Synchrotron Radiat Facil,Div Phys Biol, Shanghai 201800, Peoples R China.;  Fan, CH (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, CAS Key Lab Interfacial Phys & Technol, Shanghai Synchrotron Radiat Facil,Bioimaging Ctr, Shanghai 201800, Peoples R China.
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Dna Nanotechnology  Gold  Nanoimprinting Lithography  Nanoparticles  Self-assembly  
Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility 期刊论文
MICROELECTRONIC ENGINEERING, 2016, 卷号: 155, 页码: 55-60
Authors:  Fan, D;  Buitrago, E;  Yang, SM;  Karim, W;  Wu, YQ;  Tai, RZ;  Ekinci, Y;  Buitrago, E (reprint author), Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland.;  Yang, SM (reprint author), Shanghai Inst Appl Phys, Shanghai Synchrotron Radiat Facil, 239 Zhangheng Rd, Shanghai, Peoples R China.
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Euv  Interference Lithography  High Resolution  Nano-lithography  Achromatic Talbot Lithography