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Comprehensive characterization of TSV etching performance with phase-contrast X-ray microtomography 期刊论文
JOURNAL OF SYNCHROTRON RADIATION, 2020, 卷号: 27, 页码: 1023-1032
Authors:  Li, K;  Deng, B;  Zhang, HP;  Yu, FC;  Xue, YL;  Xie, CQ;  Ye, TC;  Xiao, TQ
View  |  Adobe PDF(1887Kb)  |  Favorite  |  View/Download:4/0  |  Submit date:2021/09/06
Study of SiGe selective epitaxial process integration with high-k and metal gate for 16/14 nm nodes FinFET technology 期刊论文
MICROELECTRONIC ENGINEERING, 2016, 卷号: 163, 页码: 49-54
Authors:  Wang, GL;  Qin, CL;  Yin, HX;  Luo, J;  Duan, NY;  Yang, P;  Gao, XY;  Yang, T;  Li, JF;  Yan, J;  Zhu, HL;  Wang, WW;  Chen, DP;  Ye, TC;  Zhao, C;  Radamson, HH;  Luo, J (reprint author), Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China.
View  |  Adobe PDF(1459Kb)  |  Favorite  |  View/Download:167/47  |  Submit date:2017/03/02
Finfet  Sige Selective Epitaxy  Rpcvd  High-k & Metal Gate  
用~2H-苯丙氨酸示踪和GC-MS分析技术测定人体内苯丙氨酸-4-羟化酶活力 期刊论文
同位素, 1992, 期号: 01
Authors:  戴腾昌;  夏宗勤;  张建华;  胡雅儿;  陆汉明;  李宣海;  彭孝伟;  施强华;  徐信容;  黄光禄;  秦燕;  施晓谋;  庄道玲;  马喆
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